SCHEMBL2173487

SCHEMBL2173487

CC(C)[C]1CC(C(C)C)=Cc2ccccc21

nearest known ligand 0.42

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CDC25A P30304 1/20 0.42
CDC25B P30305 1/20 0.42
PTPN1 P18031 1/20 0.32
PTGS2 P35354 1/20 0.31
MALT1 Q9UDY8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1577597 0.74 PTGS2 (0.41) CDC25ACDC25BPTGS2
SCHEMBL30018454 0.74 PTGS2 (0.41) CDC25ACDC25BPTGS2
SCHEMBL7616904 0.72 PRCP (0.35) CDC25ACDC25B
Hydrochloric Acid SCHEMBL8317645 0.71 CYP11B2 (0.39) CDC25ACDC25BPTGS2
SCHEMBL5953571 0.65 GABRA1 (0.39)
SCHEMBL2481925 0.64 TRPA1 (0.38)
SCHEMBL14339845 0.64 ALDH1A1 (0.30)
SCHEMBL28476230 0.64 KDM1A (0.46) PTGS2
SCHEMBL2741662 0.61 ALOX5 (0.45) PTGS2
SCHEMBL4652068 0.61 PTGS2 (0.41) PTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7972763-B2 Patterns having high resolution; used for semiconductor microfabrication employing a lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-07-05 US disclosed
US-20080153036-A1 Chemically amplified positive resist compostion SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-06-26 US disclosed