SCHEMBL217658

SCHEMBL217658

CCOC(=O)C(C)=COC(=O)C(N=Nc1ccc(C(=O)OCC)cc1)C(C)=O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.47
RAB9A P51151 4/20 0.47
NPC1 O15118 2/20 0.47
ACHE P22303 2/20 0.45
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
ESR1 P03372 1/20 0.40
CA7 P43166 1/20 0.40
CA9 Q16790 1/20 0.40
ESR2 Q92731 1/20 0.40
CA14 Q9ULX7 1/20 0.40
NOS3 P29474 2/20 0.39
NOS1 P29475 2/20 0.39
NOS2 P35228 2/20 0.39
LMNA P02545 2/20 0.39
CYP1A2 P05177 1/20 0.39
CYP3A4 P08684 1/20 0.39
MAOA P21397 1/20 0.39
PRSS1 P07477 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL217696 0.93 RAB9A (0.41) MAPTRAB9ANPC1ACHECA1
SCHEMBL216222 0.91 ACHE (0.38) MAPTRAB9ANPC1ACHELMNA
SCHEMBL218279 0.88 CES2 (0.37) MAPTRAB9ANPC1ACHECA12
SCHEMBL217788 0.84 MEN1 (0.37) MAPTRAB9ANPC1ACHECA12
SCHEMBL5699058 0.80 RAB9A (0.56) MAPTRAB9ANPC1ACHECA12
SCHEMBL4698545 0.78 RAB9A (0.50) MAPTRAB9ANPC1ACHECA12
SCHEMBL28848848 0.77 MAPT (0.47) MAPTRAB9ANPC1ACHECA12
SCHEMBL3080728 0.72 MAPT (0.75) MAPTRAB9ANPC1ACHECA12
SCHEMBL3080726 0.72 MAPT (0.75) MAPTRAB9ANPC1ACHECA12
SCHEMBL18821709 0.70 MAPT (0.67) MAPTRAB9ANPC1ACHECA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1465877-B1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING AZ ELECTRONIC MATERIALS USA (US) 2008-09-24 EP claimed
EP-1845415-A2 Process for producing an image using a first minimum bottom antireflective coating composition AZ Electronic Materials USA Corp. (US) 2007-10-17 EP claimed
EP-1720066-A2 Process for producing an image using a first minimum bottom antireflective coating composition AZ Electronic Materials USA Corp. (US) 2006-11-08 EP claimed
US-20060199103-A1 Process for producing an image using a first minimum bottom antireflective coating composition NEISSER MARK O 2006-09-07 US claimed
EP-1466216-B1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION AZ ELECTRONIC MATERIALS USA (US) 2006-07-26 EP claimed
US-7070914-B2 Process for producing an image using a first minimum bottom antireflective coating composition AZ ELECTRONIC MATERIALS USA CORP. (US) 2006-07-04 US claimed
US-6844131-B2 Positive-working photoimageable bottom antireflective coating CLARIANT FINANCE (BVI) LIMITED (VG) 2005-01-18 US claimed
EP-1466216-A1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION AZ Electronic Materials USA Corp. (US) 2004-10-13 EP claimed
EP-1465877-A1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING Clariant International Ltd. (CH) 2004-10-13 EP claimed
WO-2003057678-A1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 WO claimed
WO-2003058348-A1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 WO claimed
US-20030129547-A1 Process for producing an image using a first minimum bottom antireflective coating composition MERCK PATENT GMBH (DE) 2003-07-10 US claimed
US-20030129531-A1 Positive-working photoimageable bottom antireflective coating MERCK PATENT GMBH (DE) 2003-07-10 US claimed
US-20230146910-A1 METHODS AND COMPOSITIONS FOR IMPROVED PATTERNING OF PHOTORESIST TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2023-05-11 US disclosed
US-20220392764-A1 UNDERLAYER OF MULTILAYER STRUCTURE AND METHODS OF USE THEREOF TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2022-12-08 US disclosed
EP-2384457-B1 COATING COMPOSITIONS MERCK PATENT GMBH (DE) 2022-07-06 EP disclosed
WO-2003058345-A2 NEGATIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 WO disclosed
WO-2003057678-A1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 WO disclosed
US-20030129547-A1 Process for producing an image using a first minimum bottom antireflective coating composition MERCK PATENT GMBH (DE) 2003-07-10 US disclosed
US-20030129531-A1 Positive-working photoimageable bottom antireflective coating MERCK PATENT GMBH (DE) 2003-07-10 US disclosed