SCHEMBL217788

SCHEMBL217788

CCOC(=O)C(C)=COC(=O)C(N=Nc1ccc(S(=O)(=O)O)cc1)C(C)=O

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.37
KMT2A Q03164 3/20 0.37
POLB P06746 1/20 0.35
CYP2D6 P10635 1/20 0.35
PHLPP2 Q6ZVD8 1/20 0.35
CES2 O00748 3/20 0.35
ACHE P22303 3/20 0.35
CES1 P23141 3/20 0.35
RPS6KA3 P51812 1/20 0.34
CYP1A2 P05177 2/20 0.33
CYP2C9 P11712 1/20 0.33
PTPN1 P18031 1/20 0.32
PTPN6 P29350 1/20 0.32
PTPN11 Q06124 1/20 0.32
PRSS1 P07477 1/20 0.32
ACR P10323 1/20 0.32
ALDH1A1 P00352 3/20 0.32
LMNA P02545 2/20 0.32
GAA P10253 1/20 0.32
HPGD P15428 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL218279 0.86 CES2 (0.37) MEN1KMT2ACES2ACHECES1
SCHEMBL217658 0.84 MAPT (0.47) MEN1KMT2APOLBCES2ACHE
SCHEMBL216222 0.84 ACHE (0.38) MEN1KMT2APOLBCES2ACHE
SCHEMBL217696 0.83 RAB9A (0.41) MEN1KMT2ACES2ACHECES1
SCHEMBL4698800 0.73 CYP2D6 (0.41) MEN1KMT2APOLBCYP2D6PHLPP2
SCHEMBL5572378 0.73 POLB (0.53) MEN1KMT2APOLBCYP2D6PHLPP2
SCHEMBL11767203 0.68 NPC1 (0.41) MEN1KMT2APOLBCYP1A2ALDH1A1
SCHEMBL10108483 0.68 POLB (0.55) KMT2APOLBALDH1A1LMNAGAA
SCHEMBL8437175 0.68 ALDH1A1 (0.47) MEN1KMT2APOLBCES2ACHE
SCHEMBL8437177 0.68 ALDH1A1 (0.47) MEN1KMT2APOLBCES2ACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 106 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1845415-B1 Process for producing an image using a first minimum bottom antireflective coating composition AZ ELECTRONIC MATERIALS USA (US) 2014-04-30 EP claimed
EP-1465877-B1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING AZ ELECTRONIC MATERIALS USA (US) 2008-09-24 EP claimed
EP-1845415-A2 Process for producing an image using a first minimum bottom antireflective coating composition AZ Electronic Materials USA Corp. (US) 2007-10-17 EP claimed
EP-1720066-A2 Process for producing an image using a first minimum bottom antireflective coating composition AZ Electronic Materials USA Corp. (US) 2006-11-08 EP claimed
US-20060199103-A1 Process for producing an image using a first minimum bottom antireflective coating composition NEISSER MARK O 2006-09-07 US claimed
EP-1466216-B1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION AZ ELECTRONIC MATERIALS USA (US) 2006-07-26 EP claimed
US-7070914-B2 Process for producing an image using a first minimum bottom antireflective coating composition AZ ELECTRONIC MATERIALS USA CORP. (US) 2006-07-04 US claimed
US-6844131-B2 Positive-working photoimageable bottom antireflective coating CLARIANT FINANCE (BVI) LIMITED (VG) 2005-01-18 US claimed
EP-1466216-A1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION AZ Electronic Materials USA Corp. (US) 2004-10-13 EP claimed
EP-1465877-A1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING Clariant International Ltd. (CH) 2004-10-13 EP claimed
WO-2003058348-A1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 WO claimed
WO-2003057678-A1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 WO claimed
US-20030129547-A1 Process for producing an image using a first minimum bottom antireflective coating composition MERCK PATENT GMBH (DE) 2003-07-10 US claimed
US-20030129531-A1 Positive-working photoimageable bottom antireflective coating MERCK PATENT GMBH (DE) 2003-07-10 US claimed
US-20230146910-A1 METHODS AND COMPOSITIONS FOR IMPROVED PATTERNING OF PHOTORESIST TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2023-05-11 US disclosed
US-20220392764-A1 UNDERLAYER OF MULTILAYER STRUCTURE AND METHODS OF USE THEREOF TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2022-12-08 US disclosed
EP-2384457-B1 COATING COMPOSITIONS MERCK PATENT GMBH (DE) 2022-07-06 EP disclosed
WO-2003058345-A2 NEGATIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 WO disclosed
US-20030129547-A1 Process for producing an image using a first minimum bottom antireflective coating composition MERCK PATENT GMBH (DE) 2003-07-10 US disclosed
US-20030129531-A1 Positive-working photoimageable bottom antireflective coating MERCK PATENT GMBH (DE) 2003-07-10 US disclosed