SCHEMBL218279

SCHEMBL218279

CCOC(=O)C(C)=COC(=O)C(N=Nc1ccc(O)cc1)C(C)=O

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 4/20 0.37
CES1 P23141 4/20 0.37
ACHE P22303 4/20 0.37
CA12 O43570 2/20 0.35
CA1 P00915 2/20 0.35
CA2 P00918 2/20 0.35
CA7 P43166 2/20 0.35
CA9 Q16790 2/20 0.35
CA14 Q9ULX7 2/20 0.35
ESR1 P03372 1/20 0.35
ESR2 Q92731 1/20 0.35
MAPT P10636 5/20 0.34
LMNA P02545 3/20 0.34
MIF P14174 2/20 0.34
MEN1 O00255 1/20 0.34
S1PR4 O95977 1/20 0.34
S1PR1 P21453 1/20 0.34
MAPK1 P28482 1/20 0.34
KMT2A Q03164 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL216222 0.88 ACHE (0.38) CES2CES1ACHEMAPTLMNA
SCHEMBL217658 0.88 MAPT (0.47) CES2CES1ACHECA12CA1
SCHEMBL217788 0.86 MEN1 (0.37) CES2CES1ACHECA12CA2
SCHEMBL217696 0.86 RAB9A (0.41) CES2CES1ACHECA1CA2
SCHEMBL11767203 0.71 NPC1 (0.41) CA12CA1CA2CA9MAPT
SCHEMBL8437177 0.71 ALDH1A1 (0.47) CES2CES1ACHEMAPTLMNA
SCHEMBL8437175 0.71 ALDH1A1 (0.47) CES2CES1ACHEMAPTLMNA
SCHEMBL4701487 0.70 NPC1 (0.39) CA12CA2CA7CA9MAPT
SCHEMBL5698975 0.70 NPC1 (0.46) CA12CA2CA7CA9ESR1
SCHEMBL22460012 0.69 MAPT (0.41) MAPTMEN1MAPK1KMT2ANPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1465877-B1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING AZ ELECTRONIC MATERIALS USA (US) 2008-09-24 EP claimed
EP-1845415-A2 Process for producing an image using a first minimum bottom antireflective coating composition AZ Electronic Materials USA Corp. (US) 2007-10-17 EP claimed
EP-1720066-A2 Process for producing an image using a first minimum bottom antireflective coating composition AZ Electronic Materials USA Corp. (US) 2006-11-08 EP claimed
US-20060199103-A1 Process for producing an image using a first minimum bottom antireflective coating composition NEISSER MARK O 2006-09-07 US claimed
EP-1466216-B1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION AZ ELECTRONIC MATERIALS USA (US) 2006-07-26 EP claimed
US-7070914-B2 Process for producing an image using a first minimum bottom antireflective coating composition AZ ELECTRONIC MATERIALS USA CORP. (US) 2006-07-04 US claimed
US-6844131-B2 Positive-working photoimageable bottom antireflective coating CLARIANT FINANCE (BVI) LIMITED (VG) 2005-01-18 US claimed
EP-1466216-A1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION AZ Electronic Materials USA Corp. (US) 2004-10-13 EP claimed
EP-1465877-A1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING Clariant International Ltd. (CH) 2004-10-13 EP claimed
WO-2003057678-A1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 WO claimed
WO-2003058348-A1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 WO claimed
US-20030129547-A1 Process for producing an image using a first minimum bottom antireflective coating composition MERCK PATENT GMBH (DE) 2003-07-10 US claimed
US-20030129531-A1 Positive-working photoimageable bottom antireflective coating MERCK PATENT GMBH (DE) 2003-07-10 US claimed
US-20230146910-A1 METHODS AND COMPOSITIONS FOR IMPROVED PATTERNING OF PHOTORESIST TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2023-05-11 US disclosed
US-20220392764-A1 UNDERLAYER OF MULTILAYER STRUCTURE AND METHODS OF USE THEREOF TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2022-12-08 US disclosed
EP-2384457-B1 COATING COMPOSITIONS MERCK PATENT GMBH (DE) 2022-07-06 EP disclosed
WO-2003058348-A1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 WO disclosed
WO-2003057678-A1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 WO disclosed
US-20030129547-A1 Process for producing an image using a first minimum bottom antireflective coating composition MERCK PATENT GMBH (DE) 2003-07-10 US disclosed
US-20030129531-A1 Positive-working photoimageable bottom antireflective coating MERCK PATENT GMBH (DE) 2003-07-10 US disclosed