SCHEMBL22374145

SCHEMBL22374145

O=C(CI)Oc1ccc(C(O)O)c(F)c1F

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
▸ CES2 O00748 1/20 0.33
▸ CES1 P23141 1/20 0.33
▸ ALOX15 P16050 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22279459 0.77 KDM4E (0.36) CES2CES1ALOX15
SCHEMBL21605344 0.70 CES2 (0.33) CES2CES1
SCHEMBL6693604 0.68 ALDH1A1 (0.42) ALOX15
SCHEMBL15763955 0.66 CES2 (0.42) CES2CES1
SCHEMBL10395175 0.65 PIM1 (0.50) ALOX15
SCHEMBL27786228 0.63 CES2 (0.39) CES2CES1
SCHEMBL1993192 0.63 ALOX15 (0.46) CES2CES1ALOX15
SCHEMBL24378768 0.62 LMNA (0.53) —
SCHEMBL7041954 0.62 CYP1A2 (0.38) —
SCHEMBL29007736 0.61 CYP4F2 (0.38) CES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11720020-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 — — US disclosed
US-11415887-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-08-16 — — US disclosed
US-20210063879-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-03-04 — — US disclosed
US-20200272048-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-27 — — US disclosed
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