SCHEMBL231600

SCHEMBL231600

O=C(O)C1CCCCC12C(=O)OC2=O

nearest known ligand 0.36

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.36
TSHR P16473 1/20 0.36
HSD11B1 P28845 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3157012 1.00 LMNA (0.36) LMNATSHRHSD11B1
SCHEMBL9016948 0.94 TP53 (0.31) LMNATSHR
SCHEMBL1481003 0.71 TP53 (0.36) LMNATSHR
SCHEMBL8621964 0.71 TP53 (0.32) LMNATSHR
SCHEMBL19433874 0.69 HSD11B1 (0.37) LMNATSHRHSD11B1
SCHEMBL25218266 0.67 GRM4 (0.38) LMNATSHRHSD11B1
SCHEMBL14536263 0.67 HSD11B1 (0.36) LMNATSHRHSD11B1
SCHEMBL643447 0.67 TP53 (0.32) LMNATSHR
SCHEMBL11362509 0.67 GAA (0.33)
SCHEMBL8621959 0.67 MAPK1 (0.33) LMNATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 287 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113227064-B Method for producing crystals of cyclohexanetricarboxylic anhydride and crystals 三菱瓦斯化学株式会社 2024-07-19 CN claimed
CN-114716675-A Adjustable water-soluble battery adhesive and preparation method thereof 江苏环峰电工材料有限公司广州分公司 2022-07-08 CN claimed
CN-113227064-A Process for producing crystals of cyclohexanetricarboxylic anhydride and crystals 三菱瓦斯化学株式会社 2021-08-06 CN claimed
WO-2020129466-A1 METHOD FOR PRODUCING CRYSTAL OF CYCLOHEXANE TRICARBOXYLIC ACID ANHYDRIDE, AND CRYSTAL 三菱瓦斯化学株式会社 2020-06-25 WO claimed
US-10381533-B2 Optical semiconductor element mounting substrate and optical semiconductor device using thermosetting resin composition for light reflection HITACHI CHEMICAL COMPANY, LTD. (JP) 2019-08-13 US claimed
EP-2940053-B1 RESIN COMPOSITION, PREPREG, AND FILM MITSUBISHI GAS CHEMICAL CO (JP) 2018-06-13 EP claimed
US-9957349-B2 Resin composition, prepreg, and film MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-05-01 US claimed
US-20170040513-A1 OPTICAL SEMICONDUCTOR ELEMENT MOUNTING SUBSTRATE AND OPTICAL SEMICONDUCTOR DEVICE USING THERMOSETTING RESIN COMPOSITION FOR LIGHT REFLECTION RESONAC CORPORATION (JP) 2017-02-09 US claimed
US-20150337075-A1 RESIN COMPOSITION, PREPREG, AND FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2015-11-26 US claimed
EP-2940053-A1 RESIN COMPOSITION, PREPREG, AND FILM Mitsubishi Gas Chemical Company, Inc. (JP) 2015-11-04 EP claimed
US-20120142822-A1 THERMOSETTING RESIN COMPOSITION FOR SURFACE PROTECTION LAYERS MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-07 US claimed
US-20100140638-A1 THERMOSETTING RESIN COMPOSITION FOR LIGHT REFLECTION, METHOD FOR MANUFACTURING THE RESIN COMPOSITION AND OPTICAL SEMICONDUCTOR ELEMENT MOUNTING SUBSTRATE AND OPTICAL SEMICONDUCTOR DEVICE USING THE RESIN COMPOSITION HITACHI CHEMICAL CO., LTD. (JP) 2010-06-10 US claimed
EP-1754734-B1 CURING AGENT FOR EPOXY RESINS AND EPOXY RESIN COMPOSITIONS MITSUBISHI GAS CHEMICAL CO (JP) 2010-03-10 EP claimed
EP-1686121-B1 LIQUID CYCLOHEXANE-TRICARBOXYLIC ACID ANHYDRIDE MITSUBISHI GAS CHEMICAL CO (JP) 2010-02-10 EP claimed
EP-2100908-A1 HEAT CURABLE RESIN COMPOSITION FOR LIGHT REFLECTION, PROCESS FOR PRODUCING THE RESIN COMPOSITION, AND OPTICAL SEMICONDUCTOR ELEMENT MOUNTING SUBSTRATE AND OPTICAL SEMICONDUCTOR DEVICE USING THE RESIN COMPOSITION Hitachi Chemical Company, Ltd. (JP) 2009-09-16 EP claimed
US-7569708-B2 Trans, trans-1,2,4-cyclohexanetricarboxylic acid-1,2-anhydride liquid; highly radiation transparent (color number <100 Hazen); seals for photoelectric transducers; coatings. adhesives; molding materials; plasticizers; solar cells; formed by melting 1,2,4-cyclohexanetricarboxylic acid at 180-300 degrees MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2009-08-04 US claimed
US-20080306223-A1 Curing Agent for Epoxy Resins and Epoxy Resin Compositions OKOSHI ATSUSHI 2008-12-11 US claimed
US-20070123716-A1 Liquid cyclohexane-tricarboxylic acid anhydride MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-05-31 US claimed
EP-1754734-A1 CURING AGENT FOR EPOXY RESINS AND EPOXY RESIN COMPOSITIONS MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-02-21 EP claimed
EP-1686121-A1 LIQUID CYCLOHEXANE-TRICARBOXYLIC ACID ANHYDRIDE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-08-02 EP claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070123716-A1 Liquid cyclohexane-tricarboxylic acid anhydride HCAR1, TECR, HCAR2 LMNA 2316/4885TSHR 1061/4885HSD11B1 2635/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.