Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.33 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.31 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2565949 | 0.80 | FDPS (0.33) | — | |
| SCHEMBL21283129 | 0.79 | CHRNB2 (0.35) | SIGMAR1PLA2G1BPLA2G2A | |
| SCHEMBL7940910 | 0.78 | — | — | |
| SCHEMBL4663429 | 0.77 | — | — | |
| SCHEMBL10367595 | 0.76 | KDM4E (0.32) | — | |
| SCHEMBL18886517 | 0.75 | — | — | |
| SCHEMBL10285142 | 0.75 | TSHR (0.35) | — | |
| SCHEMBL2565897 | 0.75 | OPRM1 (0.33) | PLA2G1BPLA2G2A | |
| SCHEMBL1612949 | 0.75 | TSHR (0.35) | — | |
| SCHEMBL436979 | 0.75 | PLA2G1B (0.39) | SIGMAR1PLA2G1BPLA2G2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 79 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2605069-B1 | RINSE LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING PATTERN USING SAME | MERCK PATENT GMBH (DE) | 2021-09-22 | — | — | EP | claimed |
| EP-3208659-A1 | COMPOSITION FOR RESIST PATTERNING AND METHOD FOR FORMING PATTERN USING SAME | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2017-08-23 | — | — | EP | claimed |
| US-20170219927-A1 | COMPOSITION FOR RESIST PATTERNING AND METHOD FOR FORMING PATTERN USING SAME | AZ ELECTRIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2017-08-03 | — | — | US | claimed |
| US-20130164694-A1 | RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYING THE SAME | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2013-06-27 | — | — | US | claimed |
| EP-2605069-A1 | RINSE LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING PATTERN USING SAME | AZ Electronic Materials USA Corp. (US) | 2013-06-19 | — | — | EP | claimed |
| US-7771620-B2 | Polyelectrolyte composition for humidity senser, polyelectrolyte ink and preparation method of poly electrolyte membrane for sensor by inkjet printing | Haeun Chemtec Co., Ltd (KR) | 2010-08-10 | — | — | US | claimed |
| EP-1664167-B1 | THE POLYELECTROLYTE COMPOSITION FOR HUMIDITY SENSOR, POLYELECTROLYTE INK AND PREPARATION METHOD OF POLYELECTROLYTE MEMBRANE FOR SENSOR BY INKJET PRINTING | HAEUN CHEMTEC CO LTD (KR) | 2008-12-10 | — | — | EP | claimed |
| US-20070182791-A1 | Polyelectrolyte composition for humidity senser, polyelectrolyte ink and preparation method of poly electrolyte membrane for sensor by inkjet printing | HAEUN CHEMTEC CO., LTD. (KR) | 2007-08-09 | — | — | US | claimed |
| EP-1230971-B1 | Composite polyamide reverse osmosis membrane and method for producing the same | SAEHAN IND INC (KR) | 2005-05-11 | — | — | EP | claimed |
| EP-1230971-A1 | Composite polyamide reverse osmosis membrane and method for producing the same | SAEHAN INDUSTRIES, INC. (KR) | 2002-08-14 | — | — | EP | claimed |
| US-6245234-B1 | REACTION PRODUCT OF POLYFUNCTIONAL AMINE AND A REACTION PRODUCT OF A POLYFUNCTIONAL TERTIARY AMINE AND AN ACID, AND AN ORGANIC SOLVENT SOLUTION OF AMINE-REACTIVE REACTANT CONSISTING OF A POLYFUNCTIONAL ACYL HALIDE, SULFONYL HALIDE OR | SAEHAN INDUSTRIES INCORPORATION (KR) | 2001-06-12 | — | — | US | claimed |
| US-12569503-B2 | Methods and compositions for substituted axially-chiral cannabinol analogs | UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) | 2026-03-10 | — | — | US | disclosed |
| US-12372875-B2 | Composition for resist pattern metallization process | NISSAN CHEMICAL CORPORATION (JP) | 2025-07-29 | — | — | US | disclosed |
| WO-2024258074-A1 | PHOTORESIST CLEANING SOLUTION COMPOSITION, AND METHOD FOR FORMING PHOTORESIST PATTERN BY USING SAME | 에스케이 주식회사 | 2024-12-19 | — | — | WO | disclosed |
| WO-2024258076-A1 | PHOTORESIST CLEANING SOLUTION COMPOSITION AND METHOD FOR FORMING PHOTORESIST PATTERN USING SAME | 에스케이 주식회사 | 2024-12-19 | — | — | WO | disclosed |
| US-4980067-A | Separation of microorganisms | CUNO, INC. (US) | 1990-12-25 | — | — | US | disclosed |
| US-4791063-A | REMOVAL OF CONTAMINANTS FROM BIOLOGICAL FLUIDS | CUNO INCORPORATED (US) | 1988-12-13 | — | — | US | disclosed |
| US-4260770-A | Naphtholactam dyes | CIBA-GEIGY AKTIENGESELLSCHAFT (DE) | 1981-04-07 | — | — | US | disclosed |
| US-4083847-A | Transiently water-soluble disperse mono-azo dyes containing a diamino-methylene-carbacyl group | CIBA-GEIGY CORPORATION (US) | 1978-04-11 | — | — | US | disclosed |
| US-3932359-A | ARTIFICIAL LEATHER | KYOWA HAKKO KOGYO CO., LTD. (JA) | 1976-01-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12569503-B2 | Methods and compositions for substituted axially-chiral cannabinol analogs | OPRD1, OPRM1, OPRK1 | SIGMAR1 7/4885PLA2G1B 1283/4885PLA2G2A 1530/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.