SCHEMBL23908704

SCHEMBL23908704

O=C(O)c1ccc(-c2cccc(C(F)(F)F)c2)c(C(=O)O)c1C(F)(F)F

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 3/20 0.47
AKR1C2 P52895 3/20 0.47
RORC P51449 3/20 0.47
RORB Q92753 3/20 0.47
RXRA P19793 1/20 0.46
RXRB P28702 1/20 0.46
KMO O15229 2/20 0.45
ALDH1A1 P00352 2/20 0.44
KDM4E B2RXH2 1/20 0.44
HPGD P15428 1/20 0.44
HSD17B10 Q99714 1/20 0.44
ACLY P53396 1/20 0.44
GRIK1 P39086 1/20 0.43
MCL1 Q07820 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.42
XDH P47989 1/20 0.42
PIN1 Q13526 1/20 0.42
MPO P05164 1/20 0.42
CNR2 P34972 1/20 0.42
TRPM2 O94759 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5851623 0.79 RORC (0.54) AKR1C3AKR1C2RORCRORBKMO
SCHEMBL23175100 0.79 AKR1C3 (0.46) AKR1C3AKR1C2RORCRORBRXRA
SCHEMBL1398852 0.78 RORB (0.68) AKR1C3AKR1C2RORCRORBKMO
SCHEMBL2135018 0.77 RXRA (0.54) AKR1C3AKR1C2RXRARXRBKMO
SCHEMBL14252238 0.76 RXRA (0.56) RXRARXRBKMOALDH1A1KDM4E
SCHEMBL10601020 0.76 ALDH1A1 (0.46) AKR1C3AKR1C2RORCRORBRXRA
SCHEMBL272323 0.75 RXRA (0.55) RXRARXRBKMOALDH1A1KDM4E
SCHEMBL11351560 0.75 AKR1C3 (0.44) AKR1C3AKR1C2RORCRORBKMO
SCHEMBL10588475 0.74 RORB (0.56) AKR1C3AKR1C2RORCRORBKMO
SCHEMBL28857279 0.74 ACMSD (0.65) RXRARXRBKMOALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3896114-B1 POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHINETSU CHEMICAL CO (JP) 2023-10-18 EP disclosed
US-11572442-B2 Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2023-02-07 US disclosed
EP-3896114-A1 NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT Shin-Etsu Chemical Co., Ltd. (JP) 2021-10-20 EP disclosed
US-20210317270-A1 NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11572442-B2 Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component BRIX1, RBX1, HAX1 AKR1C3 3444/4885AKR1C2 3762/4885RORC 1626/4885
US-20210317270-A1 NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT BRIX1, HAX1, RBX1 AKR1C3 3251/4885AKR1C2 3589/4885RORC 1842/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.