SCHEMBL241382

SCHEMBL241382

CCO[Si](OCC)(OCC)c1ccccc1Cl

nearest known ligand 0.36

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.36
TSHR P16473 1/20 0.36
PNMT P11086 1/20 0.35
L3MBTL1 Q9Y468 4/20 0.34
GAA P10253 1/20 0.33
IDO1 P14902 3/20 0.32
SLC6A2 P23975 1/20 0.32
SLC6A4 P31645 1/20 0.32
SLC6A3 Q01959 1/20 0.32
PDE4B Q07343 1/20 0.32
CASP1 P29466 1/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
KDM4E B2RXH2 1/20 0.32
POLB P06746 1/20 0.32
ALDH1A1 P00352 1/20 0.31
TAAR1 Q96RJ0 2/20 0.31
HSD11B1 P28845 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL331176 0.84 ALDH1A1 (0.33) TSHRALDH1A1
SCHEMBL29520127 0.84 ALDH1A1 (0.33) TSHRALDH1A1
SCHEMBL3337293 0.84 PNMT (0.36) LMNATSHRPNMTL3MBTL1GAA
SCHEMBL10398399 0.83 LMNA (0.36) LMNATSHRPNMTL3MBTL1GAA
Benzene SCHEMBL28867986 0.82 LTA4H (0.37) TSHRL3MBTL1MEN1KMT2AKDM4E
SCHEMBL20535921 0.82 LMNA (0.35) LMNATSHRPNMTL3MBTL1GAA
SCHEMBL29001313 0.80 LMNA (0.33) LMNATSHRPNMTL3MBTL1GAA
SCHEMBL1109615 0.78 PKM (0.34) TSHRKDM4EALDH1A1
SCHEMBL109759 0.77 TSHR (0.38) LMNATSHRGAAMEN1KMT2A
SCHEMBL668366 0.76 TSHR (0.32) LMNATSHRL3MBTL1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 436 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120025799-A Deep well polysulfonate drilling fluid and preparation method thereof 克拉玛依派特罗尔能源服务有限公司 2025-05-23 CN claimed
CN-113927991-A Multilayer composite corrugated board and application thereof in preparation of corrugated box 连云港市申润包装材料有限公司 2022-01-14 CN claimed
EP-3634432-A1 MEDICAL DEVICES Microvention, Inc. (US) 2020-04-15 EP claimed
CN-110612107-A Medical instrument 微仙美国有限公司 2019-12-24 CN claimed
US-20180325649-A1 MEDICAL DEVICES MICROVENTION, INC. 2018-11-15 US claimed
WO-2018209306-A1 MEDICAL DEVICES MICROVENTION, INC. (US) 2018-11-15 WO claimed
US-8344088-B2 Spin-on anti-reflective coatings for photolithography HONEYWELL INTERNATIONAL INC. (US) 2013-01-01 US claimed
CN-1606713-B Spincoating antireflection paint for photolithography HONEYWELL INT INC 2011-07-06 CN claimed
EP-1190277-B1 SEMICONDUCTOR HAVING SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY ALLIED SIGNAL INC (US) 2009-10-07 EP claimed
EP-1546250-B1 ORGANOSILICON COMPOUNDS AND BLENDS FOR TREATING SILICA DOW CORNING (US) 2007-12-19 EP claimed
US-20020095018-A1 Spin-on-glass anti-reflective coatings for photolithography HONEYWELL INTERNATIONAL INC. 2002-07-18 US claimed
US-20020068181-A1 Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography BALDWIN TERESA (US) 2002-06-06 US claimed
US-6368400-B1 COMBINING ALCOHOL-SUBSTITUTED FUSED BENZENE RING COMPOUND, ACETOXYSILICON COMPOUND, ALCOHOL, SOLVENT TO PRODUCE REACTION MIXTURE, REMOVING ACID BY-PRODUCTS; LIGHT ABSORBER HONEYWELL INTERNATIONAL 2002-04-09 US claimed
EP-1190277-A1 SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AlliedSignal Inc. (US) 2002-03-27 EP claimed
WO-2002006402-A1 ABSORBING COMPOUNDS FOR SPIN-ON GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY HONEYWELL INTERNATIONAL INC. (US) 2002-01-24 WO claimed
WO-2000077575-A1 SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY ALLIEDSIGNAL INC. (US) 2000-12-21 WO claimed
EP-0637902-B1 Metallic foil with adhesion promoting layer GOULD ELECTRONICS INC (US) 1999-03-31 EP claimed
CN-1106977-A Metallic foil with adhesion promoting layer COULD ELECTRONICS INC (US) 1995-08-16 CN claimed
EP-0637902-A1 Metallic foil with adhesion promoting layer GOULD ELECTRONICS INC. (US) 1995-02-08 EP claimed
US-4906676-A Resin composition containing fine silica particles therein MITSUBISHI RAYON CO., LTD. (JP) 1990-03-06 US claimed