SCHEMBL109759

SCHEMBL109759

CCO[Si](OCC)(OCC)c1ccccc1C

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.38
ACHE P22303 3/20 0.38
NPC1 O15118 2/20 0.36
RAB9A P51151 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
GAA P10253 3/20 0.32
MAPT P10636 1/20 0.31
HTT P42858 1/20 0.31
ESR1 P03372 1/20 0.31
PTGS2 P35354 1/20 0.31
ALDH1A1 P00352 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA7 P43166 1/20 0.31
CA9 Q16790 1/20 0.31
DHODH Q02127 1/20 0.31
LMNA P02545 1/20 0.31
ALOX12 P18054 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27504026 0.86 TSHR (0.33) TSHRSMN1; SMN2GAAALDH1A1DHODH
SCHEMBL331176 0.86 ALDH1A1 (0.33) TSHRNPC1RAB9AALDH1A1CYP1A2
SCHEMBL29520127 0.86 ALDH1A1 (0.33) TSHRNPC1RAB9AALDH1A1CYP1A2
SCHEMBL28458022 0.85 TAAR1 (0.41) KMT2AGAAMAPTALDH1A1CA1
Benzene SCHEMBL28867986 0.84 LTA4H (0.37) TSHRNPC1RAB9ASMN1; SMN2MEN1
SCHEMBL728326 0.83 HDAC3 (0.38)
SCHEMBL987485 0.83 TRPA1 (0.35) MEN1KMT2AGAAMAPTHTT
SCHEMBL106489 0.83 TSHR (0.35) TSHRACHENPC1RAB9ASMN1; SMN2
SCHEMBL1314878 0.83 TSHR (0.38) TSHRACHENPC1RAB9ASMN1; SMN2
SCHEMBL4241888 0.83 TSHR (0.38) TSHRACHENPC1RAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 552 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119592295-A High-fluidity high-strength alcohol-type transparent coating adhesive and manufacturing method thereof 广东长鹿新材料科技有限公司 2025-03-11 CN claimed
CN-117866204-B Silicon-containing surface modifier and etching-resistant agent underlayer film composition, and preparation method and application thereof 福建泓光半导体材料有限公司 2024-12-13 CN claimed
CN-110204900-B Flame-retardant organopolysiloxane composition and preparation method thereof 广州慧谷化学有限公司 2021-09-03 CN claimed
EP-2628744-B1 Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process SHINETSU CHEMICAL CO (JP) 2016-11-30 EP claimed
EP-2628745-B1 Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process SHINETSU CHEMICAL CO (JP) 2015-03-25 EP claimed
EP-0447959-B1 Transition metal catalyst component for a Ziegler catalytic system and its use BASF AG (DE) 1994-10-12 EP claimed
US-5162465-A Preparation of homopolymers and copolymers of propene using a Ziegler-Natta catalyst system BASF AKTIENGESELLSCHAFT (DE) 1992-11-10 US claimed
EP-0447959-A2 Transition metal catalyst component for a Ziegler catalytic system and its use BASF Aktiengesellschaft (DE) 1991-09-25 EP claimed
JP-3124705-A None JP disclosed
US-20260118767-A1 REVERSE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-30 US disclosed
US-20260062517-A1 POLYAMIC ACID COMPOSITION WITH IMPROVED ADHESION AND POLYIMIDE CURED PRODUCT COMPRISING THE SAME PI ADVANCED MAT CO LTD (KR) 2026-03-05 US disclosed
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-12 US disclosed
EP-4692941-A2 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2026-02-11 EP disclosed
EP-4660703-A2 METAL-CONTAINING FILM PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2025-12-10 EP disclosed
EP-0288845-A2 Process for preparing propylene homo and copolymers by means of a Ziegler-Natta catalytic system BASF Aktiengesellschaft (DE) 1988-11-02 EP disclosed
EP-0289058-A2 A process of producing a silanic or siloxanic compound containing at least one cycloalkyl ring ISTITUTO GUIDO DONEGANI S.p.A. (IT) 1988-11-02 EP disclosed
EP-0281425-A2 A process for producing a silanic or siloxanic compound containing at least one cycloalkylic ring ISTITUTO GUIDO DONEGANI S.p.A. (IT) 1988-09-07 EP disclosed
EP-0076656-B1 SOLVENT-SOLUBLE ORGANOPOLYSILSESQUIOXANES, PROCESSES FOR PRODUCING THE SAME, AND COMPOSITIONS AND SEMICONDUCTOR DEVICES USING THE SAME JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1988-06-01 EP disclosed
US-4626556-A LADDER POLYMERS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1986-12-02 US disclosed
EP-0076656-A2 Solvent-soluble organopolysilsesquioxanes, processes for producing the same, and compositions and semiconductor devices using the same JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-04-13 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260062517-A1 POLYAMIC ACID COMPOSITION WITH IMPROVED ADHESION AND POLYIMIDE CURED PRODUCT COMPRISING THE SAME AOC1, AOC2, DDT TSHR 2535/4885ACHE 2938/4885NPC1 4869/4885
US-20260118767-A1 REVERSE PATTERNING PROCESS EFNA1, EPHA4, ETV6 TSHR 770/4885ACHE 4460/4885NPC1 1625/4885
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SMC1A, SPOUT1, LBR TSHR 446/4885ACHE 4843/4885NPC1 3305/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.