SCHEMBL2467083

SCHEMBL2467083

O=C(O)CC(F)(F)C(F)(F)Br

nearest known ligand 0.41

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ACLY P53396 3/20 0.41
ALDH1A1 P00352 1/20 0.38
HMGCR P04035 1/20 0.38
CHRM1 P11229 1/20 0.38
TBXA2R P21731 1/20 0.38
ADRA1A P35348 1/20 0.38
TSHR P16473 2/20 0.36
CYP2C19 P33261 2/20 0.36
HIF1A Q16665 2/20 0.36
CYP2D6 P10635 1/20 0.36
MIF P14174 1/20 0.32
CPT2 P23786 2/20 0.32
KDM4E B2RXH2 1/20 0.32
FFAR1 O14842 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9438232 0.82 ACLY (0.48) ACLYALDH1A1HMGCRCHRM1TBXA2R
SCHEMBL28665121 0.79 ACLY (0.46) ACLYALDH1A1HMGCRCHRM1TBXA2R
SCHEMBL865358 0.77 ACLY (0.44) ACLYALDH1A1HMGCRCHRM1TBXA2R
SCHEMBL11227427 0.77 ACLY (0.44) ACLYALDH1A1HMGCRCHRM1TBXA2R
SCHEMBL15284323 0.77
SCHEMBL8563267 0.74 ACLY (0.42) ACLYALDH1A1HMGCRCHRM1TBXA2R
SCHEMBL8562549 0.74 ACLY (0.42) ACLYALDH1A1HMGCRCHRM1TBXA2R
SCHEMBL28362082 0.74 ACLY (0.48) ACLYALDH1A1HMGCRCHRM1TBXA2R
SCHEMBL8344401 0.74 ACLY (0.38) ACLYALDH1A1HMGCRCHRM1TBXA2R
SCHEMBL3698957 0.74 LMNA (0.38) ALDH1A1TSHRHIF1ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11662662-B2 Photo-decomposable compound, photoresist composition including the same, and method of manufacturing integrated circuit device SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-05-30 US disclosed
US-11662662-B2 Photo-decomposable compound, photoresist composition including the same, and method of manufacturing integrated circuit device SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-05-30 US disclosed
US-11662662-B2 Photo-decomposable compound, photoresist composition including the same, and method of manufacturing integrated circuit device SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-05-30 US disclosed
US-20210223692-A1 PHOTO-DECOMPOSABLE COMPOUND, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2021-07-22 US disclosed
CN-113135873-A Photodecomposable compounds, photoresist compositions and methods for making integrated circuit devices 三星电子株式会社 2021-07-20 CN disclosed
US-9348220-B2 Photoacid generators and photoresists comprising same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2016-05-24 US disclosed
US-9348220-B2 Photoacid generators and photoresists comprising same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2016-05-24 US disclosed
US-9348220-B2 Photoacid generators and photoresists comprising same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2016-05-24 US disclosed
US-9156785-B2 Base reactive photoacid generators and photoresists comprising same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2015-10-13 US disclosed
US-8956799-B2 Photoacid generator and photoresist comprising same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2015-02-17 US disclosed
US-20120129108-A1 BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-05-24 US disclosed
EP-2452932-A2 Base reactive photoacid generators and photoresists comprising same Rohm and Haas Electronic Materials LLC (US) 2012-05-16 EP disclosed
US-20110269070-A1 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-11-03 US disclosed
US-20110269070-A1 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-11-03 US disclosed
US-20110269070-A1 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-11-03 US disclosed
EP-2372455-A2 Photoacid generators and photoresists comprising the same Rohm and Haas Electronic Materials LLC (US) 2011-10-05 EP disclosed
EP-2372455-A2 Photoacid generators and photoresists comprising the same Rohm and Haas Electronic Materials LLC (US) 2011-10-05 EP disclosed
US-6855828-B1 Detection of hypoxia THE TRUSTEES OF THE UNIVERSITY OF PENNSYLVANIA (US) 2005-02-15 US disclosed
US-20050026974-A1 Detection of hypoxia TRUSTEES OF THE UNIVERSITY OF PENNSYLVANIA 2005-02-03 US disclosed
US-6252087-B1 COMPLEXING WITH A PROTEIN THE TRUSTEES OF THE UNIVERSITY OF PENNSYLVANIA 2001-06-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050026974-A1 Detection of hypoxia HIF1A, HIF1AN, HYOU1 ACLY 1217/4885ALDH1A1 607/4885HMGCR 3489/4885
US-20210223692-A1 PHOTO-DECOMPOSABLE COMPOUND, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE C9, C1S, C1R ACLY 3016/4885ALDH1A1 584/4885HMGCR 3560/4885
US-20110269070-A1 PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME PHGDH, PGD, PGLS ACLY 294/4885ALDH1A1 1120/4885HMGCR 1807/4885
US-20120129108-A1 BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME ALAD, APEX1, HMBS ACLY 1443/4885ALDH1A1 1611/4885HMGCR 3431/4885
US-11662662-B2 Photo-decomposable compound, photoresist composition including the same, and method of manufacturing integrated circuit device C9, C1S, C1R ACLY 3016/4885ALDH1A1 584/4885HMGCR 3560/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.