SCHEMBL24944150

SCHEMBL24944150

O=C(OC1(c2ccccc2)CCNCC1)c1ccc(SC(F)(F)F)cc1

nearest known ligand 0.40

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CHRM5 P08912 4/20 0.40
KCNK2 O95069 3/20 0.40
KCNK10 P57789 2/20 0.40
LMNA P02545 2/20 0.37
OPRM1 P35372 2/20 0.36
MAPT P10636 1/20 0.36
TSHR P16473 1/20 0.36
MAPK1 P28482 1/20 0.36
HTT P42858 1/20 0.36
PDE2A O00408 3/20 0.36
HDAC1 Q13547 1/20 0.35
TACR1 P25103 1/20 0.35
CHRM4 P08173 1/20 0.34
PPARG P37231 1/20 0.33
PPARD Q03181 1/20 0.33
PPARA Q07869 1/20 0.33
NR1H4 Q96RI1 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413574 0.84 OPRM1 (0.41) OPRM1MAPTTSHRHTTHDAC1
SCHEMBL24943664 0.83 OPRM1 (0.46) LMNAOPRM1TSHRHDAC1TACR1
SCHEMBL24944313 0.81 ESR1 (0.42) LMNAOPRM1MAPTTSHRMAPK1
SCHEMBL26413775 0.81 ALDH1A1 (0.46) LMNAOPRM1TSHRHDAC1
SCHEMBL24943754 0.81 SMN1; SMN2 (0.43) OPRM1MAPTTSHRMAPK1HDAC1
SCHEMBL24944620 0.80 DRD2 (0.43) OPRM1MAPTTSHRHDAC1TACR1
SCHEMBL24943674 0.80 NPC1 (0.43) LMNAOPRM1MAPTTSHRHDAC1
SCHEMBL24944860 0.80 OPRM1 (0.47) OPRM1MAPTHDAC1TACR1
SCHEMBL24944081 0.80 OPRM1 (0.44) LMNAOPRM1MAPTHDAC1
SCHEMBL26413644 0.80 PARP10 (0.44) LMNAOPRM1MAPTTSHRHDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR CHRM5 3920/4885KCNK2 1678/4885KCNK10 2414/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.