SCHEMBL24944247

SCHEMBL24944247

O=C(/C=C/c1ccccc1O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NFKB1 P19838 2/20 0.47
CA1 P00915 1/20 0.47
CA2 P00918 1/20 0.47
CA4 P22748 1/20 0.47
JUN P05412 1/20 0.44
NFE2L2 Q16236 1/20 0.44
MAPT P10636 3/20 0.42
LMNA P02545 1/20 0.42
BCHE P06276 1/20 0.40
GUSB P08236 1/20 0.40
ALOX5 P09917 1/20 0.40
MAPK1 P28482 2/20 0.39
KDM4E B2RXH2 1/20 0.39
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39
ATM Q13315 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
CHRNA7 P36544 3/20 0.38
OPRM1 P35372 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943694 0.93 ALOX5 (0.49) NFKB1CA1CA2CA4JUN
SCHEMBL24943657 0.86 OPRM1 (0.42) MAPTLMNAKDM4ERAB9AOPRM1
SCHEMBL26478932 0.86 HSD11B1 (0.46) CA1CA2BCHEATMOPRM1
SCHEMBL24944275 0.86 MAOB (0.45) MAPTLMNANPC1RAB9AATM
SCHEMBL24944237 0.85 LMNA (0.43) NFKB1CA4MAPTLMNABCHE
SCHEMBL24944265 0.84 NFE2L2 (0.50) NFE2L2MAPTLMNABCHEMAPK1
SCHEMBL26413822 0.84 HDAC8 (0.44) MAPTLMNAMAPK1KDM4ENPC1
SCHEMBL24943655 0.84 NFE2L2 (0.50) NFE2L2MAPTLMNABCHEMAPK1
SCHEMBL24944351 0.82 KMT2A (0.41) NFE2L2MAPTLMNABCHEKDM4E
SCHEMBL26413718 0.82 MEN1 (0.56) NFKB1MAPTLMNAKDM4ENPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR NFKB1 3393/4885CA1 1910/4885CA2 472/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.