SCHEMBL26413822

SCHEMBL26413822

O=C(/C=C/c1cccc2ccccc12)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC8 Q9BY41 1/20 0.44
HDAC6 Q9UBN7 1/20 0.44
NPC1 O15118 2/20 0.41
KDM4E B2RXH2 2/20 0.41
RAB9A P51151 2/20 0.41
SMN1; SMN2 Q16637 3/20 0.41
MAPT P10636 2/20 0.41
ALDH1A1 P00352 2/20 0.41
HPGD P15428 2/20 0.41
CYP1A1 P04798 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP2D6 P10635 1/20 0.41
NPY1R P25929 1/20 0.41
MAPK1 P28482 1/20 0.41
NPY2R P49146 1/20 0.41
CYP1B1 Q16678 1/20 0.41
BACE1 P56817 1/20 0.38
MTNR1A P48039 1/20 0.38
MTNR1B P49286 1/20 0.38
LMNA P02545 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943694 0.85 ALOX5 (0.49) NPC1KDM4ERAB9AMAPTMAPK1
SCHEMBL24944247 0.84 NFKB1 (0.47) NPC1KDM4ERAB9AMAPTMAPK1
SCHEMBL24943657 0.83 OPRM1 (0.42) KDM4ERAB9ASMN1; SMN2MAPTALDH1A1
SCHEMBL26478932 0.83 HSD11B1 (0.46) OPRM1
SCHEMBL24944275 0.83 MAOB (0.45) HDAC8HDAC6NPC1RAB9ASMN1; SMN2
SCHEMBL24944237 0.82 LMNA (0.43) HDAC8HDAC6NPC1RAB9ASMN1; SMN2
SCHEMBL24943655 0.81 NFE2L2 (0.50) NPC1KDM4ERAB9ASMN1; SMN2MAPT
SCHEMBL24944265 0.81 NFE2L2 (0.50) NPC1KDM4ERAB9ASMN1; SMN2MAPT
SCHEMBL24944351 0.80 KMT2A (0.41) NPC1KDM4ERAB9ASMN1; SMN2MAPT
SCHEMBL26413718 0.80 MEN1 (0.56) NPC1KDM4ERAB9ASMN1; SMN2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR HDAC8 3108/4885HDAC6 1851/4885NPC1 4818/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.