SCHEMBL24944265

SCHEMBL24944265

COc1ccccc1/C=C/C(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NFE2L2 Q16236 2/20 0.50
TFEB P19484 1/20 0.50
MAPT P10636 4/20 0.49
NPC1 O15118 3/20 0.49
RAB9A P51151 2/20 0.49
LMNA P02545 2/20 0.49
BCHE P06276 1/20 0.49
KDM4E B2RXH2 6/20 0.49
HPGD P15428 5/20 0.45
MAPK1 P28482 1/20 0.45
ATM Q13315 1/20 0.45
NPSR1 Q6W5P4 1/20 0.45
TDP1 Q9NUW8 1/20 0.45
CYP1A2 P05177 3/20 0.44
CYP2D6 P10635 3/20 0.44
CYP1A1 P04798 2/20 0.44
CYP1B1 Q16678 2/20 0.44
AHR P35869 1/20 0.44
LY96 Q9Y6Y9 1/20 0.44
ALDH1A1 P00352 3/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943655 1.00 NFE2L2 (0.50) NFE2L2TFEBMAPTNPC1RAB9A
SCHEMBL24944908 0.91 NFE2L2 (0.52) NFE2L2MAPTNPC1RAB9ALMNA
SCHEMBL24944351 0.89 KMT2A (0.41) NFE2L2TFEBMAPTNPC1RAB9A
SCHEMBL24944878 0.88 JUN (0.51) MAPTNPC1RAB9ALMNAKDM4E
SCHEMBL24944898 0.88 MAPT (0.54) MAPTNPC1RAB9ALMNAKDM4E
SCHEMBL26413847 0.87 NPC1 (0.47) NFE2L2NPC1RAB9ALMNACYP1A2
SCHEMBL24943657 0.86 OPRM1 (0.42) MAPTRAB9ALMNAKDM4ECYP1A2
SCHEMBL24944247 0.84 NFKB1 (0.47) NFE2L2MAPTNPC1RAB9ALMNA
SCHEMBL24944708 0.84 HTR1A (0.58) MAPTLMNAKDM4EHPGDTDP1
SCHEMBL24943717 0.84 ALOX5 (0.52) MAPTNPSR1CYP1A2CYP2D6CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR NFE2L2 3379/4885TFEB 3217/4885MAPT 2648/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.