SCHEMBL24944893

SCHEMBL24944893

O=C(Nc1cccc2ccccc12)c1ccccc1C(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRNB2 P17787 1/20 0.48
CHRNB4 P30926 1/20 0.48
CHRNA3 P32297 1/20 0.48
CHRNA4 P43681 1/20 0.48
NPC1 O15118 4/20 0.47
RAB9A P51151 4/20 0.47
HSD17B10 Q99714 1/20 0.46
CYP1A2 P05177 1/20 0.45
CYP3A4 P08684 1/20 0.45
CYP2D6 P10635 1/20 0.45
CYP2C9 P11712 1/20 0.45
CYP2C19 P33261 1/20 0.45
BACE1 P56817 2/20 0.42
ALDH1A1 P00352 3/20 0.42
KMT2A Q03164 3/20 0.42
MEN1 O00255 2/20 0.42
TP53 P04637 1/20 0.42
GAA P10253 1/20 0.42
NFKB1 P19838 1/20 0.42
NFKB2 Q00653 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944294 0.85 NR4A1 (0.44) BACE1ALDH1A1KMT2AMEN1GAA
SCHEMBL24944934 0.78 LDHA (0.48) NPC1RAB9AKMT2AMEN1MAPT
SCHEMBL24943764 0.78 KDM4E (0.43) HSD17B10CYP1A2CYP2C19ALDH1A1KMT2A
SCHEMBL26413552 0.77 KDM4E (0.50) HSD17B10ALDH1A1KMT2AGAASMN1; SMN2
SCHEMBL26479242 0.77 OPRM1 (0.36) NPC1RAB9ACYP1A2CYP3A4CYP2C9
SCHEMBL26413623 0.75 OPRM1 (0.41) HSD17B10ALDH1A1MAPTHPGD
SCHEMBL24944073 0.75 OPRM1 (0.44) ALDH1A1
SCHEMBL24943705 0.75 CDC25B (0.37) KMT2AMEN1GAA
SCHEMBL24944349 0.74 AKR1C3 (0.42) HSD17B10CYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL24944623 0.74 RXFP1 (0.46) NPC1RAB9AALDH1A1KMT2ATP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR CHRNB2 2117/4885CHRNB4 1301/4885CHRNA3 1547/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.