SCHEMBL24944708

SCHEMBL24944708

COc1cc(/C=C/C(=O)OC2(c3ccccc3)CCNCC2)cc(OC)c1OC

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR1A P08908 2/20 0.58
ALDH1A1 P00352 5/20 0.50
KDM4E B2RXH2 4/20 0.50
HPGD P15428 2/20 0.50
HSD17B10 Q99714 2/20 0.50
HTR2C P28335 1/20 0.50
LMNA P02545 2/20 0.47
MAPT P10636 2/20 0.47
ABCB1 P08183 2/20 0.47
TNFRSF1A P19438 1/20 0.47
GAA P10253 1/20 0.47
HTT P42858 1/20 0.47
CYP1A2 P05177 1/20 0.46
CYP2D6 P10635 1/20 0.46
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
TDP1 Q9NUW8 2/20 0.46
TUBB4A P04350 1/20 0.46
TUBB P07437 1/20 0.46
TUBA3C P0DPH7 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943717 0.91 ALOX5 (0.52) HTR1AMAPTCYP1A2CYP2D6CYP3A4
SCHEMBL24943719 0.89 ALDH1A1 (0.52) ALDH1A1KDM4EHPGDHSD17B10LMNA
SCHEMBL24944887 0.87 EPHX2 (0.56) ALDH1A1KDM4EHPGDHSD17B10LMNA
SCHEMBL26413847 0.85 NPC1 (0.47) HTR1ALMNACYP1A2CYP2D6KMT2A
SCHEMBL24944908 0.85 NFE2L2 (0.52) ALDH1A1KDM4ELMNAMAPTCYP1A2
SCHEMBL24944889 0.85 TTR (0.53) MAPTCYP1A2TUBB4ATUBBTUBA3C
SCHEMBL24944265 0.84 NFE2L2 (0.50) ALDH1A1KDM4EHPGDLMNAMAPT
SCHEMBL24943655 0.84 NFE2L2 (0.50) ALDH1A1KDM4EHPGDLMNAMAPT
SCHEMBL24944237 0.83 LMNA (0.43) ALDH1A1LMNAMAPTTNFRSF1ACYP1A2
SCHEMBL24943658 0.83 BCHE (0.50) ALDH1A1KDM4EMAPTTNFRSF1ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR HTR1A 3785/4885ALDH1A1 4767/4885KDM4E 1069/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.