SCHEMBL24944908

SCHEMBL24944908

COc1cccc(/C=C/C(=O)OC2(c3ccccc3)CCNCC2)c1OC

nearest known ligand 0.52

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
NFE2L2 Q16236 3/20 0.52
TRPM8 Q7Z2W7 2/20 0.50
CYP1A1 P04798 1/20 0.47
CYP1A2 P05177 1/20 0.47
CYP2D6 P10635 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
KMT2A Q03164 2/20 0.46
NPC1 O15118 1/20 0.45
RAB9A P51151 1/20 0.45
ALOX5 P09917 1/20 0.45
KDM4E B2RXH2 1/20 0.45
MEN1 O00255 1/20 0.45
LMNA P02545 1/20 0.45
MAPT P10636 1/20 0.45
MAPK1 P28482 1/20 0.45
MAOB P27338 1/20 0.43
LY96 Q9Y6Y9 1/20 0.43
ALDH1A1 P00352 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413847 0.92 NPC1 (0.47) NFE2L2TRPM8CYP1A1CYP1A2CYP2D6
SCHEMBL24943655 0.91 NFE2L2 (0.50) NFE2L2CYP1A1CYP1A2CYP2D6KMT2A
SCHEMBL24944265 0.91 NFE2L2 (0.50) NFE2L2CYP1A1CYP1A2CYP2D6KMT2A
SCHEMBL24944708 0.85 HTR1A (0.58) CYP1A2CYP2D6KMT2AKDM4EMEN1
SCHEMBL24944351 0.83 KMT2A (0.41) NFE2L2CYP1A1CYP1A2CYP2D6KMT2A
SCHEMBL24944898 0.82 MAPT (0.54) CYP1A1CYP1A2CYP2D6KMT2ANPC1
SCHEMBL24944878 0.82 JUN (0.51) L3MBTL1KMT2ANPC1RAB9AKDM4E
SCHEMBL24943657 0.82 OPRM1 (0.42) TRPM8CYP1A2CYP2D6RAB9AKDM4E
SCHEMBL24943694 0.81 ALOX5 (0.49) NFE2L2NPC1RAB9AALOX5KDM4E
SCHEMBL24944247 0.81 NFKB1 (0.47) NFE2L2NPC1RAB9AALOX5KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR NFE2L2 3379/4885TRPM8 2192/4885CYP1A1 4768/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.