SCHEMBL24944889

SCHEMBL24944889

COc1ccc(/C=C/C(=O)OC2(c3ccccc3)CCNCC2)cc1O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TTR P02766 1/20 0.53
TUBB1 Q9H4B7 4/20 0.50
BACE1 P56817 3/20 0.47
MAOA P21397 1/20 0.47
MAOB P27338 1/20 0.47
SYNJ2 O15056 1/20 0.47
APP P05067 1/20 0.46
MAPT P10636 1/20 0.46
TUBB4A P04350 2/20 0.46
TUBB P07437 2/20 0.46
TUBA3C P0DPH7 2/20 0.46
TUBA1B P68363 2/20 0.46
TUBA4A P68366 2/20 0.46
TUBB4B P68371 2/20 0.46
TUBB3 Q13509 2/20 0.46
TUBB2A Q13885 2/20 0.46
TUBB8 Q3ZCM7 2/20 0.46
TUBA3E Q6PEY2 2/20 0.46
TUBA1A Q71U36 2/20 0.46
TUBA1C Q9BQE3 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944887 0.92 EPHX2 (0.56) TTRBACE1MAOAMAOBAPP
SCHEMBL24943719 0.91 ALDH1A1 (0.52) TTRMAOBMAPTCYP1A1CYP1A2
SCHEMBL24943717 0.87 ALOX5 (0.52) MAPTCYP1A2
SCHEMBL24944708 0.85 HTR1A (0.58) TUBB1MAPTTUBB4ATUBBTUBA3C
SCHEMBL24943658 0.83 BCHE (0.50) BACE1MAOAMAOBMAPTCYP1A2
SCHEMBL24944264 0.83 BCHE (0.53) MAOAMAOBMAPTCYP1A1CYP1A2
SCHEMBL24943655 0.82 NFE2L2 (0.50) MAOBMAPTCYP1A1CYP1A2CYP1B1
SCHEMBL24944265 0.82 NFE2L2 (0.50) MAOBMAPTCYP1A1CYP1A2CYP1B1
SCHEMBL24944274 0.82 AKR1B10 (0.48) MAOAMAOB
SCHEMBL24944237 0.81 LMNA (0.43) MAOBMAPTCA12CA4CA6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR TTR 2495/4885TUBB1 2306/4885BACE1 4595/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.