Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.54 |
| ▸ | TSHR | P16473 | 3/20 | 0.50 |
| ▸ | MEN1 | O00255 | 3/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | THRB | P10828 | 2/20 | 0.43 |
| ▸ | HTT | P42858 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | ACHE | P22303 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.33 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.33 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetraethylene Glycol SCHEMBL2702085 | 1.00 | ALDH1A1 (0.54) | ALDH1A1TSHRMEN1KMT2AMAPK1 | |
| Di(Hydroxyethyl)Ether SCHEMBL483309 | 0.98 | ALDH1A1 (0.56) | ALDH1A1TSHRMEN1KMT2AMAPK1 | |
| Diethylene Glycol Monoethyl Ether SCHEMBL9639594 | 0.96 | ALDH1A1 (0.61) | ALDH1A1TSHRMEN1KMT2AMAPK1 | |
| 2-Ethoxyethanol SCHEMBL2387013 | 0.91 | ALDH1A1 (0.67) | ALDH1A1TSHRMEN1KMT2AMAPK1 | |
| 2-Ethoxyethanol SCHEMBL21496405 | 0.91 | ALDH1A1 (0.67) | ALDH1A1TSHRMEN1KMT2AMAPK1 | |
| Triethylene Glycol SCHEMBL11270224 | 0.91 | MEN1 (0.58) | ALDH1A1TSHRMEN1KMT2AMAPK1 | |
| Di(Hydroxyethyl)Ether SCHEMBL721175 | 0.89 | ALDH1A1 (0.56) | ALDH1A1TSHRMEN1KMT2AMAPK1 | |
| Triethylene Glycol SCHEMBL273267 | 0.86 | ALDH1A1 (0.59) | ALDH1A1TSHRMEN1KMT2AMAPK1 | |
| Ether SCHEMBL1561703 | 0.86 | ALDH1A1 (0.53) | ALDH1A1TSHRKMT2ATHRBLMNA | |
| Di(Hydroxyethyl)Ether SCHEMBL21647891 | 0.86 | ALDH1A1 (0.65) | ALDH1A1TSHRMEN1KMT2AMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 626 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111936936-B | Imidazolidinone-containing compositions for removal of post-ash residues and/or for oxide etching of TiN-containing layers or masks | 巴斯夫欧洲公司 | 2025-02-21 | — | — | CN | claimed |
| CN-109423291-B | Etching solution for selectively removing silicon-germanium alloy from silicon-germanium/silicon stack in the manufacture of semiconductor devices | 弗萨姆材料美国有限责任公司 | 2022-09-30 | — | — | CN | claimed |
| CN-114940926-A | Cleaning preparation | 弗萨姆材料美国有限责任公司 | 2022-08-26 | — | — | CN | claimed |
| CN-111936936-A | Imidazolidinethione-containing compositions for removing post-ashing residues and/or for oxidatively etching TiN-containing layers or masks | 巴斯夫欧洲公司 | 2020-11-13 | — | — | CN | claimed |
| CN-110713868-A | Post etch residue cleaning solution capable of removing titanium nitride | 巴斯夫欧洲公司 | 2020-01-21 | — | — | CN | claimed |
| CN-102453149-A | Olefin polymerization catalyst component, olefin polymerization catalyst, and olefin polymerization method | CHINA PETROLEUM & CHEMICAL | 2012-05-16 | — | — | CN | claimed |
| CN-101760355-A | The wet clean compositions that is used for CoWP and porous dielectric | AIR PROD & CHEM | 2010-06-30 | — | — | CN | claimed |
| EP-2199379-A1 | Wet clean compositions for CoWP and porous dielectrics | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-06-23 | — | — | EP | claimed |
| US-20100152086-A1 | Wet Clean Compositions for CoWP and Porous Dielectrics | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-06-17 | — | — | US | claimed |
| US-20060011584-A1 | Etchant and etching method | DAIKIN INDUSTRIES, LTD. (JP) | 2006-01-19 | — | — | US | claimed |
| EP-1538664-A1 | ETCHANT AND ETCHING METHOD | Daikin Industries, Ltd. (JP) | 2005-06-08 | — | — | EP | claimed |
| US-20260139364-A1 | COMPOSITION FOR TREATING SEMICONDUCTOR DEVICE, MANUFACTURING METHOD OF MODIFIED SUBSTRATE, MANUFACTURING METHOD OF LAMINATE, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND COMPOUND | FUJIFILM CORP (JP) | 2026-05-21 | — | — | US | disclosed |
| US-12630727-B2 | Photocurable inkjet printing ink composition | SAKATA INX CORPORATION (JP) | 2026-05-19 | — | — | US | disclosed |
| US-20260125594-A1 | QUANTUM DOT-CONTAINING COMPOSITION AND METHOD FOR PRODUCING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-07 | — | — | US | disclosed |
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-0013006-B1 | DEVELOPER COMPOSITION FOR LITHOGRAPHIC PRINTING PLATES | MITSUBISHI KASEI CORPORATION (JP) | 1983-06-22 | — | — | EP | disclosed |
| EP-0037179-A2 | Developer composition for lithographic printing plates, a method of plate development, and developed plates | MITSUBISHI KASEI CORPORATION (JP) | 1981-10-07 | — | — | EP | disclosed |
| US-4271261-A | PHOTOSENSITIVE POLYMER | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1981-06-02 | — | — | US | disclosed |
| EP-0013006-A1 | Developer composition for lithographic printing plates | MITSUBISHI KASEI CORPORATION (JP) | 1980-07-09 | — | — | EP | disclosed |
| US-4186122-A | POLYESTER-AMIDE-IMIDE COPOLYMERS | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1980-01-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | SRSF1, MACF1, SRPK1 | ALDH1A1 3642/4885TSHR 4084/4885MEN1 2480/4885 |
| US-20260125594-A1 | QUANTUM DOT-CONTAINING COMPOSITION AND METHOD FOR PRODUCING THE SAME | ITGA6, STRA6, ILK | ALDH1A1 1562/4885TSHR 1369/4885MEN1 4558/4885 |
| US-20260139364-A1 | COMPOSITION FOR TREATING SEMICONDUCTOR DEVICE, MANUFACTURING METHOD OF MODIFIED SUBSTRATE, MANUFACTURING METHOD OF LAMINATE, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND COMPOUND | ADH1A, ADH5, ADH1C | ALDH1A1 5/4885TSHR 3848/4885MEN1 3141/4885 |
| US-12630727-B2 | Photocurable inkjet printing ink composition | OR10J3, TAS2R20, ILK | ALDH1A1 41/4885TSHR 2979/4885MEN1 2986/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.