Methacrylic Acid

Methacrylic Acid

SCHEMBL28226348

C=C(C)C(=O)O.CC1CCc2c(ccc3c2ccc2ccccc23)C1.c1cc[nH]c1

nearest known ligand 0.35

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.34
CYP2D6 P10635 1/20 0.34
CYP2C9 P11712 1/20 0.34
CYP2C19 P33261 1/20 0.34
HIF1A Q16665 1/20 0.34
TLR2 O60603 2/20 0.34
KAT8 Q9H7Z6 1/20 0.34
HTR7 P34969 3/20 0.33
HTR1A P08908 2/20 0.33
KDM4E B2RXH2 2/20 0.33
ALDH1A1 P00352 2/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
MAPT P10636 2/20 0.33
NFKB1 P19838 1/20 0.33
NFKB2 Q00653 1/20 0.33
RELA Q04206 1/20 0.33
GLA P06280 1/20 0.33
GAA P10253 1/20 0.33
RCE1 Q9Y256 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL27630262 0.94 CYP1A2 (0.38) CYP1A2CYP2D6CYP2C9CYP2C19HIF1A
Pyrrole SCHEMBL28853016 0.89 HTR7 (0.40) CYP1A2HTR7HTR1AKDM4EALDH1A1
Methacrylic Acid SCHEMBL27630245 0.82 LNPEP (0.37) CYP1A2CYP2D6CYP2C9CYP2C19HIF1A
SCHEMBL27574172 0.82 HTR7 (0.45) CYP1A2HTR7HTR1AKDM4EALDH1A1
Methacrylic Acid SCHEMBL27650291 0.81 NFKB1 (0.36) CYP1A2CYP2D6CYP2C9CYP2C19HIF1A
Methacrylic Acid SCHEMBL28204534 0.81 HCAR2 (0.36) CYP1A2CYP2D6CYP2C9CYP2C19HIF1A
Fluoride SCHEMBL27587185 0.80 HTR7 (0.44) CYP1A2HTR7HTR1AKDM4EALDH1A1
Methacrylic Acid SCHEMBL27650287 0.80 MAPT (0.39) CYP1A2CYP2D6CYP2C9CYP2C19HIF1A
Pyrrole SCHEMBL28093231 0.80 ALDH1A1 (0.39) CYP1A2KDM4EALDH1A1MAPTNFKB1
Methacrylic Acid SCHEMBL27650290 0.78 NFKB1 (0.34) CYP1A2CYP2D6CYP2C9CYP2C19HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108241256-A Chemically amplified positive photosensitive resin composition, method for producing substrate with mold, and method for producing molded article by plating 奇美实业股份有限公司 2018-07-03 CN disclosed