Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 3/20 | 0.39 |
| ▸ | METAP2 | P50579 | 2/20 | 0.37 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA7 | P43166 | 1/20 | 0.34 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.34 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.33 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.32 |
| ▸ | NR1H2 | P55055 | 2/20 | 0.32 |
| ▸ | STAT5B | P51692 | 1/20 | 0.32 |
| ▸ | PPARA | Q07869 | 1/20 | 0.32 |
| ▸ | STAT3 | P40763 | 1/20 | 0.32 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28953548 | 0.85 | HSD11B1 (0.41) | HSD11B1METAP2NFE2L2MCL1HDAC7 | |
| SCHEMBL1089508 | 0.75 | HSD11B1 (0.41) | HSD11B1CA12CA1CA7CA14 | |
| SCHEMBL29130828 | 0.74 | ALDH1A1 (0.36) | HSD11B1CA1 | |
| SCHEMBL6351061 | 0.73 | CSNK2A1 (0.41) | HDAC7 | |
| SCHEMBL9010921 | 0.73 | ALDH1A1 (0.39) | HSD11B1 | |
| SCHEMBL384366 | 0.73 | CES2 (0.51) | HSD11B1 | |
| SCHEMBL9010834 | 0.72 | KAT6A (0.49) | HSD11B1 | |
| SCHEMBL383775 | 0.72 | ALDH1A1 (0.41) | CA12CA1CA7CA14 | |
| SCHEMBL384364 | 0.70 | CES2 (0.51) | HSD11B1 | |
| SCHEMBL28778814 | 0.69 | CSNK2A1 (0.50) | METAP2CA12CA1CA7CA14 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108107676-B | Chemically amplified positive resist film laminate and pattern formation method | 信越化学工业株式会社 | 2023-02-21 | — | — | CN | disclosed |