SCHEMBL9010834

SCHEMBL9010834

Cc1cccc(C(=O)C(=[N+]=[N-])S(=O)(=O)c2ccccc2)c1

nearest known ligand 0.49

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KAT6A Q92794 2/20 0.49
SMN1; SMN2 Q16637 2/20 0.44
POLB P06746 3/20 0.42
PARP1 P09874 1/20 0.41
ALDH1A1 P00352 3/20 0.41
MEN1 O00255 3/20 0.40
KMT2A Q03164 3/20 0.40
KCNK3 O14649 1/20 0.40
KCNK9 Q9NPC2 1/20 0.40
MAPT P10636 2/20 0.40
CTDSP1 Q9GZU7 1/20 0.40
HDAC8 Q9BY41 1/20 0.40
HDAC6 Q9UBN7 1/20 0.40
LMNA P02545 1/20 0.39
RECQL P46063 1/20 0.38
HSD11B1 P28845 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9010783 0.92 ALDH1A1 (0.47) KAT6ASMN1; SMN2POLBPARP1ALDH1A1
SCHEMBL546386 0.85 CES2 (0.45) KAT6ASMN1; SMN2ALDH1A1MEN1KMT2A
SCHEMBL384364 0.84 CES2 (0.51) SMN1; SMN2ALDH1A1MEN1KMT2AMAPT
SCHEMBL384366 0.84 CES2 (0.51) SMN1; SMN2ALDH1A1MEN1KMT2AMAPT
SCHEMBL9010819 0.83 BRD4 (0.44) KAT6ASMN1; SMN2PARP1ALDH1A1MEN1
SCHEMBL6929196 0.83 PGR (0.44) KAT6APARP1ALDH1A1MEN1KMT2A
SCHEMBL9010756 0.83 HSD11B1 (0.57) KAT6ASMN1; SMN2PARP1ALDH1A1MEN1
SCHEMBL6933539 0.81 KAT6A (0.49) KAT6ASMN1; SMN2POLBPARP1ALDH1A1
SCHEMBL6932205 0.80 MAPT (0.50) SMN1; SMN2PARP1ALDH1A1MEN1KMT2A
SCHEMBL9010806 0.80 KMT2A (0.43) SMN1; SMN2POLBPARP1ALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0417556-B1 Positive-working radiation-sensitive mixture and recording material prepared therefrom HOECHST AG (DE) 1996-12-11 EP disclosed
EP-0444493-B1 Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom HOECHST AG (DE) 1996-11-20 EP disclosed
US-5424166-A Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom HOECHST AKTIENGESELLSCHAFT (DE) 1995-06-13 US disclosed
US-5340682-A Sensitive, heat resistant, noncorrosive HOECHST AKTIENGESELLSCHAFT (DE) 1994-08-23 US disclosed
EP-0444493-A2 Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1991-09-04 EP disclosed
EP-0417556-A2 Positive-working radiation-sensitive mixture and recording material prepared therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1991-03-20 EP disclosed