SCHEMBL2957840

SCHEMBL2957840

O=S(=O)(OS(c1ccccc1)(c1ccccc1)c1ccccc1)c1ccccc1F

nearest known ligand 0.44

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.44
MEN1 O00255 2/20 0.44
NPC1 O15118 1/20 0.44
RAB9A P51151 1/20 0.44
SENP8 Q96LD8 1/20 0.44
SENP7 Q9BQF6 1/20 0.44
SENP6 Q9GZR1 1/20 0.44
HSD11B1 P28845 1/20 0.40
KAT6A Q92794 3/20 0.38
KCNA5 P22460 1/20 0.38
ALDH1A1 P00352 2/20 0.37
HTR6 P50406 3/20 0.37
HPGD P15428 1/20 0.37
APOBEC3G Q9HC16 1/20 0.35
POLB P06746 1/20 0.35
GAA P10253 1/20 0.35
AKR1B1 P15121 1/20 0.35
NFE2L2 Q16236 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2960439 0.91 HTT (0.41) KMT2AMEN1NPC1RAB9ASENP8
SCHEMBL2957979 0.88 MMP13 (0.43) KMT2AMEN1NPC1RAB9ASENP8
SCHEMBL2966033 0.86 HSD11B1 (0.42) KMT2AMEN1NPC1RAB9ASENP8
SCHEMBL2956233 0.84 PKM (0.45) KMT2AMEN1NPC1RAB9ASENP8
SCHEMBL2537987 0.83 HTR2A (0.41) KMT2AMEN1ALDH1A1HTR6GAA
SCHEMBL137133 0.78 HTR6 (0.48) KMT2AALDH1A1HTR6HPGDAPOBEC3G
SCHEMBL451960 0.77 KMT2A (0.46) KMT2AMEN1RAB9AHSD11B1KAT6A
SCHEMBL2954165 0.76 HTR2A (0.39) KMT2AMEN1ALDH1A1GAA
SCHEMBL384539 0.76 CA1 (0.46) KMT2AALDH1A1HTR6HPGDAPOBEC3G
SCHEMBL2955282 0.76 KMT2A (0.49) KMT2AMEN1HSD11B1ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7759045-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-07-20 US disclosed
US-20090004601-A1 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-01-01 US disclosed
US-6893794-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-05-17 US disclosed
US-20040018445-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-01-29 US disclosed
US-20030068573-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-10 US disclosed