SCHEMBL29637818

SCHEMBL29637818

CC1=NN(c2cc(Cl)c(S(=O)(=O)[O-])cc2Cl)C(=O)C1N=Nc1cccc(S(=O)(=O)NCCc2ccccc2)c1.[Na+]

nearest known ligand 0.42

Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 4/20 0.42
▸ KMT2A Q03164 4/20 0.42
▸ NPC1 O15118 3/20 0.42
▸ MAPT P10636 3/20 0.42
▸ CYP1A2 P05177 1/20 0.42
▸ GAA P10253 1/20 0.42
▸ ALDH1A1 P00352 3/20 0.41
▸ SMN1; SMN2 Q16637 3/20 0.41
▸ LMNA P02545 2/20 0.41
▸ MAPK1 P28482 2/20 0.41
▸ RAB9A P51151 2/20 0.41
▸ TDP1 Q9NUW8 1/20 0.41
▸ PKM P14618 1/20 0.40
▸ SFRP1 Q8N474 1/20 0.39
▸ KDM4E B2RXH2 1/20 0.38
▸ TAAR1 Q96RJ0 1/20 0.38
▸ HSD17B10 Q99714 1/20 0.38
▸ TSHR P16473 1/20 0.38
▸ PRMT1 Q99873 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL226987 0.79 MEN1 (0.51) MEN1KMT2ANPC1MAPTCYP1A2
SCHEMBL3953142 0.79 MEN1 (0.51) MEN1KMT2ANPC1MAPTCYP1A2
SCHEMBL30893167 0.78 MEN1 (0.47) MEN1KMT2ANPC1MAPTCYP1A2
SCHEMBL3953150 0.77 KMT2A (0.48) MEN1KMT2ANPC1MAPTCYP1A2
SCHEMBL3953138 0.77 KMT2A (0.48) MEN1KMT2ANPC1MAPTCYP1A2
SCHEMBL30634681 0.77 KMT2A (0.48) MEN1KMT2ANPC1MAPTCYP1A2
SCHEMBL29544137 0.76 MAPT (0.57) MEN1KMT2ANPC1MAPTCYP1A2
SCHEMBL2866190 0.75 MAPT (0.58) MEN1KMT2ANPC1MAPTCYP1A2
SCHEMBL30544458 0.75 MAPT (0.58) MEN1KMT2ANPC1MAPTCYP1A2
SCHEMBL9111595 0.73 MEN1 (0.49) MEN1KMT2ANPC1MAPTCYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250290249-A1 DIRECT TO FILM TRANSFER PROCESS FOR INKJET INKS ON SUBSTRATES USING PIGMENTED POLYMER POWDERS Prism Inks, Inc. (US) 2025-09-18 — — US disclosed
EP-4617076-A1 DIRECT TO FILM TRANSFER PROCESS FOR INKJET INKS ON SUBSTRATES USING PIGMENTED POLYMER POWDERS Prism Inks, Inc. (US) 2025-09-17 — — EP disclosed
CN-118369217-A Writing tool 三菱铅笔株式会社 2024-07-19 — — CN disclosed
US-11697743-B2 Ink composition, writing instrument and method for producing ink composition PENTEL KABUSHIKI KAISHA 2023-07-11 — — US disclosed
WO-2023112533-A1 POLARIZING SHEET 三菱瓦斯化学株式会社 2023-06-22 — — WO disclosed
WO-2023063280-A1 FILM UNDERFILL MATERIAL, RESIN COMPOSITION FOR FILM UNDERFILL MATERIAL, METHOD FOR MANUFACTURING SEMICONDUCTOR CHIP WITH RESIN COMPOSITION LAYER USING FILM UNDERFILL MATERIAL, METHOD FOR MANUFACTURING SUBSTRATE FOR MOUNTING SEMICONDUCTOR CHIP WITH RESIN COMPOSITION LAYER, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 三菱瓦斯化学株式会社 2023-04-20 — — WO disclosed
US-11613663-B2 Ink composition, writing tool and method for producing ink composition PENTEL KABUSHIKI KAISHA 2023-03-28 — — US disclosed
CN-111094474-B Near-infrared-curable ink composition, near-infrared-curable film, method for producing near-infrared-curable film, and method for photo-molding 住友金属矿山株式会社 2022-06-07 — — CN disclosed
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