SCHEMBL3140903

SCHEMBL3140903

Cc1ccc(S(=O)(=O)OS(c2ccccc2)(c2ccc(C(C)(C)C)cc2)c2ccc(C(C)(C)C)cc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 4/20 0.48
BCHE P06276 2/20 0.48
ACHE P22303 2/20 0.48
HSD17B3 P37058 1/20 0.48
TSHR P16473 1/20 0.46
LMNA P02545 2/20 0.43
ALDH1A1 P00352 3/20 0.42
HTT P42858 2/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
NPC1 O15118 1/20 0.41
RECQL P46063 1/20 0.41
RAB9A P51151 1/20 0.41
VDR P11473 1/20 0.41
CYP3A4 P08684 1/20 0.39
CYP2C19 P33261 1/20 0.39
HSD17B2 P37059 2/20 0.39
GAA P10253 1/20 0.39
MEN1 O00255 1/20 0.39
KMT2A Q03164 1/20 0.39
KEAP1 Q14145 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL452980 1.00 HSD11B1 (0.48) HSD11B1BCHEACHEHSD17B3TSHR
SCHEMBL7028778 0.94 BCHE (0.53) HSD11B1BCHEACHEHSD17B3TSHR
SCHEMBL451539 0.94 HSD11B1 (0.53) HSD11B1HSD17B3LMNAALDH1A1NPC1
SCHEMBL2634260 0.94 HSD11B1 (0.53) HSD11B1HSD17B3LMNAALDH1A1NPC1
SCHEMBL5171841 0.92 ALDH1A1 (0.50) HSD11B1BCHEACHEHSD17B3LMNA
SCHEMBL2955938 0.89 VDR (0.49) BCHEACHELMNAALDH1A1HTT
SCHEMBL64190 0.89 VDR (0.49) BCHEACHELMNAALDH1A1HTT
SCHEMBL2962485 0.89 VDR (0.49) BCHEACHELMNAALDH1A1HTT
SCHEMBL2964106 0.89 VDR (0.49) BCHEACHELMNAALDH1A1HTT
SCHEMBL3144536 0.89 VDR (0.49) BCHEACHELMNAALDH1A1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-7642368-B2 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-05 US disclosed
EP-1676835-A1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2006-07-05 EP disclosed