Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 3/20 | 0.53 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.47 |
| ▸ | RECQL | P46063 | 2/20 | 0.45 |
| ▸ | NPC1 | O15118 | 2/20 | 0.45 |
| ▸ | RAB9A | P51151 | 2/20 | 0.45 |
| ▸ | UQCRB | P14927 | 1/20 | 0.42 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 3/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 3/20 | 0.41 |
| ▸ | CA2 | P00918 | 3/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | MAOA | P21397 | 1/20 | 0.40 |
| ▸ | NR3C2 | P08235 | 1/20 | 0.40 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.40 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.40 |
| ▸ | CA9 | Q16790 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2634260 | 1.00 | HSD11B1 (0.53) | HSD11B1HSD17B3ALDH1A1RECQLNPC1 | |
| SCHEMBL452980 | 0.94 | HSD11B1 (0.48) | HSD11B1HSD17B3ALDH1A1RECQLNPC1 | |
| SCHEMBL3140903 | 0.94 | HSD11B1 (0.48) | HSD11B1HSD17B3ALDH1A1RECQLNPC1 | |
| SCHEMBL3693053 | 0.92 | HSD11B1 (0.50) | HSD11B1HSD17B3ALDH1A1RECQLNPC1 | |
| SCHEMBL3134871 | 0.92 | HSD11B1 (0.47) | HSD11B1HSD17B3ALDH1A1RECQLNPC1 | |
| SCHEMBL3134802 | 0.92 | HSD11B1 (0.47) | HSD11B1HSD17B3ALDH1A1RECQLNPC1 | |
| SCHEMBL7738774 | 0.90 | HSD11B1 (0.45) | HSD11B1HSD17B3ALDH1A1RECQLNPC1 | |
| SCHEMBL7741633 | 0.90 | HSD11B1 (0.45) | HSD11B1HSD17B3ALDH1A1RECQLNPC1 | |
| SCHEMBL5171841 | 0.86 | ALDH1A1 (0.50) | HSD11B1HSD17B3ALDH1A1RECQLMAPT | |
| SCHEMBL7028778 | 0.86 | BCHE (0.53) | HSD11B1HSD17B3ALDH1A1RECQLNPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3010943-B1 | CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM | CANON KK (JP) | 2024-04-03 | — | — | EP | disclosed |
| EP-2841255-B1 | RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS | CANON KK (JP) | 2020-05-13 | — | — | EP | disclosed |
| US-10472445-B2 | Photocurable composition and method for manufacturing film | CANON KABUSHIKI KAISHA (JP) | 2019-11-12 | — | — | US | disclosed |
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | CANON KABUSHIKI KAISHA (JP) | 2019-09-24 | — | — | US | disclosed |
| EP-2758987-B1 | METHOD OF FORMING A FILM | CANON KK (JP) | 2019-03-20 | — | — | EP | disclosed |
| US-10208183-B2 | Curable composition, film, and method of producing film | CANON KABUSHIKI KAISHA (JP) | 2019-02-19 | — | — | US | disclosed |
| US-9982102-B2 | Photocurable composition and method of manufacturing film using the composition | CANON KABUSHIKI KAISHA (JP) | 2018-05-29 | — | — | US | disclosed |
| US-9961776-B2 | Method of producing cured product and method of forming pattern | CANON KABUSHIKI KAISHA (JP) | 2018-05-01 | — | — | US | disclosed |
| EP-2847235-B1 | PHOTOCURABLE COMPOSITION AND METHOD OF MANUFACTURING FILM USING THE COMPOSITION | CANON KK (JP) | 2017-11-22 | — | — | EP | disclosed |
| EP-2850650-B1 | PHOTOCURABLE COMPOSITION AND METHOD FOR MANUFACTURING A FILM | CANON KK (JP) | 2017-09-20 | — | — | EP | disclosed |
| EP-1953593-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-08-06 | — | — | EP | disclosed |
| US-7335457-B2 | Positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-02-26 | — | — | US | disclosed |
| US-20070031758-A1 | Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material | JSR CORPORATION (JP) | 2007-02-08 | — | — | US | disclosed |
| EP-1750176-A2 | Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material | JSR Corporation (JP) | 2007-02-07 | — | — | EP | disclosed |
| US-7060414-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-06-13 | — | — | US | disclosed |
| US-20060078821-A1 | A caroboxyalkylanthracene based compound, a hydroxy or alkoxystyrene polymer, and a sulfonimide compound as photoacid generator; low sublimation properties and excellent compatibility with other components; exhibits optimum controllability of radiation transmittance; microfabrication | JSR CORPORATION (JP) | 2006-04-13 | — | — | US | disclosed |
| EP-1640804-A2 | Positive-tone radiation-sensitive resin composition | JSR Corporation (JP) | 2006-03-29 | — | — | EP | disclosed |
| US-20050158657-A1 | Radiation-sensitive resin composition | SUZUKI AKI (JP) | 2005-07-21 | — | — | US | disclosed |
| US-6899989-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-05-31 | — | — | US | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | PFN1, PFAS, FRG1 | HSD11B1 4332/4885HSD17B3 4273/4885ALDH1A1 4165/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.