Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 4/20 | 0.48 |
| ▸ | BCHE | P06276 | 2/20 | 0.48 |
| ▸ | ACHE | P22303 | 2/20 | 0.48 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 2/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | HTT | P42858 | 2/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.42 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | RECQL | P46063 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | VDR | P11473 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | HSD17B2 | P37059 | 2/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3140903 | 1.00 | HSD11B1 (0.48) | HSD11B1BCHEACHEHSD17B3TSHR | |
| SCHEMBL7028778 | 0.94 | BCHE (0.53) | HSD11B1BCHEACHEHSD17B3TSHR | |
| SCHEMBL451539 | 0.94 | HSD11B1 (0.53) | HSD11B1HSD17B3LMNAALDH1A1NPC1 | |
| SCHEMBL2634260 | 0.94 | HSD11B1 (0.53) | HSD11B1HSD17B3LMNAALDH1A1NPC1 | |
| SCHEMBL5171841 | 0.92 | ALDH1A1 (0.50) | HSD11B1BCHEACHEHSD17B3LMNA | |
| SCHEMBL2955938 | 0.89 | VDR (0.49) | BCHEACHELMNAALDH1A1HTT | |
| SCHEMBL64190 | 0.89 | VDR (0.49) | BCHEACHELMNAALDH1A1HTT | |
| SCHEMBL2962485 | 0.89 | VDR (0.49) | BCHEACHELMNAALDH1A1HTT | |
| SCHEMBL2964106 | 0.89 | VDR (0.49) | BCHEACHELMNAALDH1A1HTT | |
| SCHEMBL3144536 | 0.89 | VDR (0.49) | BCHEACHELMNAALDH1A1HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 121 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104823110-B | Photosensitive resin composition, photosensitive film, and method for forming resist pattern | 昭和电工材料株式会社 | 2021-06-04 | — | — | CN | claimed |
| EP-4328963-B1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | RESONAC CORP (JP) | 2025-08-27 | — | — | EP | disclosed |
| CN-118749078-A | Photosensitive resin composition set, optical waveguide, method for producing optical waveguide, opto-electric hybrid board, sheet set, core resin composition, coating resin composition, and resin sheet | 味之素株式会社 | 2024-10-08 | — | — | CN | disclosed |
| US-20240282684-A1 | SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME | RESONAC CORPORATION (JP) | 2024-08-22 | — | — | US | disclosed |
| US-20240250025-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE | RESONAC CORPORATION (JP) | 2024-07-25 | — | — | US | disclosed |
| US-11990396-B2 | Substrate and method for manufacturing the same | RESONAC CORPORATION (JP) | 2024-05-21 | — | — | US | disclosed |
| EP-3010943-B1 | CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM | CANON KK (JP) | 2024-04-03 | — | — | EP | disclosed |
| EP-4328963-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE | Resonac Corporation (JP) | 2024-02-28 | — | — | EP | disclosed |
| CN-117296144-A | Method for manufacturing semiconductor device and semiconductor device | 株式会社力森诺科 | 2023-12-26 | — | — | CN | disclosed |
| WO-2023145537-A1 | PHOTOSENSITIVE RESIN COMPOSITION SET, OPTICAL WAVEGUIDE AND METHOD FOR PRODUCING SAME, PHOTOELECTRIC HYBRID BOARD, SHEET SET, RESIN COMPOSITION FOR CORES, RESIN COMPOSITION FOR CLADDINGS, AND RESIN SHEET | 味の素株式会社 | 2023-08-03 | — | — | WO | disclosed |
| US-20030022095-A1 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2003-01-30 | — | — | US | disclosed |
| US-20020196896-A1 | Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2002-12-26 | — | — | US | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
| EP-1193553-A2 | Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20010038971-A1 | Chemical amplification, positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-11-08 | — | — | US | disclosed |
| US-20010033994-A1 | Chemical amplification, positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |
| US-6280902-B1 | RESIN CONVERTED TO ALKALI SOLUBLE TO ALKALI INSOLUBLE OR ALKALI SLIGHTLY ACID SOLUBLE, AN ACID GENERATOR AND NITROGEN CYCLIC COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-28 | — | — | US | disclosed |
| EP-1058153-A1 | Positive working photoresist compositions | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-12-06 | — | — | EP | disclosed |
| US-6143460-A | PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION | JSR CORPORATION (JP) | 2000-11-07 | — | — | US | disclosed |
| EP-0959389-A1 | Diazodisulfone compound and radiation-sensitive resin composition | JSR Corporation (JP) | 1999-11-24 | — | — | EP | disclosed |