Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 4/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.39 |
| ▸ | KCNA1 | Q09470 | 1/20 | 0.39 |
| ▸ | SLC22A1 | O15245 | 3/20 | 0.38 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.37 |
| ▸ | ATM | Q13315 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL272419 | 0.97 | DNM1 (0.52) | DNM1ALDH1A1TSHRNFKB1KCNA1 | |
| Water SCHEMBL3308247 | 0.94 | DNM1 (0.43) | DNM1ALDH1A1TSHRNFKB1KCNA1 | |
| Hydrochloric Acid SCHEMBL14734829 | 0.94 | DNM1 (0.50) | DNM1ALDH1A1TSHRNFKB1KCNA1 | |
| Bromide SCHEMBL7214859 | 0.94 | DNM1 (0.55) | DNM1ALDH1A1TSHRNFKB1KCNA1 | |
| Iodide SCHEMBL14777716 | 0.94 | DNM1 (0.50) | DNM1ALDH1A1TSHRNFKB1KCNA1 | |
| Hydrochloric Acid SCHEMBL27408052 | 0.92 | DNM1 (0.48) | DNM1ALDH1A1TSHRNFKB1KCNA1 | |
| Water SCHEMBL3307120 | 0.92 | DNM1 (0.55) | DNM1ALDH1A1TSHRSLC22A1SLC22A2 | |
| SCHEMBL11706247 | 0.91 | DNM1 (0.46) | DNM1ALDH1A1TSHRNFKB1KCNA1 | |
| SCHEMBL1686201 | 0.88 | DNM1 (0.57) | DNM1ALDH1A1TSHRSLC22A1SLC22A2 | |
| Hydrochloric Acid SCHEMBL9003642 | 0.87 | DNM1 (0.44) | DNM1ALDH1A1TSHRNFKB1KCNA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 125 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117761977-A | Corrosion-resistant alkaline developer | 国科天骥(滨州)新材料有限责任公司 | 2024-03-26 | — | — | CN | claimed |
| CN-116661263-A | Low-aluminum corrosion developer and preparation method and application thereof | 艾森半导体材料(南通)有限公司 | 2023-08-29 | — | — | CN | claimed |
| CN-115651162-A | Polyisocyanate composition with low free monomer, high compatibility and good open-dilution stability and preparation method thereof | 万华化学集团股份有限公司 | 2023-01-31 | — | — | CN | claimed |
| CN-115286588-A | Process for preparing pentamethylene isocyanurate | 中海油常州涂料化工研究院有限公司 | 2022-11-04 | — | — | CN | claimed |
| CN-110982045-B | Low-viscosity and low-color-number isocyanate curing agent, and preparation method and application thereof | 万华化学集团股份有限公司 | 2022-01-07 | — | — | CN | claimed |
| CN-112540515-A | Photoresist stripping liquid and preparation method and application thereof | 江苏艾森半导体材料股份有限公司 | 2021-03-23 | — | — | CN | claimed |
| CN-110982045-A | Low-viscosity and low-color-number isocyanate curing agent, and preparation method and application thereof | 万华化学集团股份有限公司 | 2020-04-10 | — | — | CN | claimed |
| US-12599937-B2 | Water-based, high-efficiency chemical reagent for substrate surface particle removal | APPLIED MATERIALS, INC. (US) | 2026-04-14 | — | — | US | disclosed |
| US-12481218-B2 | Treatment liquid, method for washing substrate, and method for removing resist | FUJIFILM CORPORATION (JP) | 2025-11-25 | — | — | US | disclosed |
| US-12386265-B2 | Pattern forming method and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2025-08-12 | — | — | US | disclosed |
| US-20250235900-A1 | WATER-BASED, HIGH-EFFICIENCY CHEMICAL REAGENT FOR SUBSTRATE SURFACE PARTICLE REMOVAL | APPLIED MATERIALS, INC. | 2025-07-24 | — | — | US | disclosed |
| US-20250215318-A1 | ETCHING COMPOSITION, ETCHING METHOD USING SAME, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-07-03 | — | — | US | disclosed |
| CN-114008537-B | Stripping composition for removing photoresist from semiconductor substrate | 富士胶片电子材料美国有限公司 | 2025-04-25 | — | — | CN | disclosed |
| US-6596819-B2 | An isocyanate group-terminated prepolymer having isocyanurate group and urethane group, obtained by reacting an organic polyisocyanate containing at least (a1) an aromatic diisocyanate with an active hydrogen group-containing compound | NIPPON POLYURETHANE INDUSTRY CO., LTD. (JP) | 2003-07-22 | — | — | US | disclosed |
| US-20030083451-A1 | Polyisocyanate curing agent for laminate adhesive and process for production thereof | NIPPON POLYURETHANE INDUSTRY CO., LTD. (JP) | 2003-05-01 | — | — | US | disclosed |
| US-6534458-B1 | This invention relates to a cleaning agent for a semi-conductor substrate, particularly, one having copper wirings on its surface, comprising a nonionic surfactant and a method for cleaning the same. control a speed of etching on | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2003-03-18 | — | — | US | disclosed |
| CN-1396210-A | Polyisocyanate curing agent for laminated material adhesive and its preparation method | NIPPON POLYURETHANE KOGYO KK (JP) | 2003-02-12 | — | — | CN | disclosed |
| US-20020016272-A1 | Cleaning agent for a semi-conductor substrate | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2002-02-07 | — | — | US | disclosed |
| US-6310019-B1 | COMPRISING NONIONIC SURFACTANT; FOR CLEANING SURFACE HAVING COPPER WIRINGS; CORROSION RESISTANCE | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2001-10-30 | — | — | US | disclosed |
| CN-1047311-A | Poly (isocyanatoalkylphenyl) isocyanurates, method for the production thereof and use thereof | MITSUI TOATSU CHEMICALS (JP) | 1990-11-28 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12599937-B2 | Water-based, high-efficiency chemical reagent for substrate surface particle removal | STUB1, CD2, EPCAM | DNM1 353/4885ALDH1A1 528/4885TSHR 2379/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.