SCHEMBL3200366

SCHEMBL3200366

CCN(CC)C(=O)C(C)C

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.42
ALDH1A1 P00352 2/20 0.40
GAA P10253 2/20 0.40
KDM4E B2RXH2 1/20 0.40
TSHR P16473 1/20 0.40
MMP1 P03956 1/20 0.40
MMP2 P08253 1/20 0.40
MMP3 P08254 1/20 0.40
MMP8 P22894 1/20 0.40
HTR1A P08908 1/20 0.38
HTT P42858 3/20 0.38
SMN1; SMN2 Q16637 2/20 0.37
DPP4 P27487 1/20 0.36
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
CA12 O43570 1/20 0.34
CA1 P00915 1/20 0.34
CA9 Q16790 1/20 0.34
MLYCD O95822 1/20 0.34
ABCB11 O95342 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3483454 0.85 TSHR (0.36) LMNAALDH1A1GAAKDM4ETSHR
SCHEMBL13332903 0.85 CA12 (0.44) LMNAALDH1A1GAAKDM4ETSHR
SCHEMBL17471264 0.85 CA12 (0.48) LMNAALDH1A1GAAKDM4ETSHR
SCHEMBL12156217 0.83 ALDH1A1 (0.43) LMNAALDH1A1GAAKDM4ETSHR
SCHEMBL13039193 0.83 MLYCD (0.37) LMNAALDH1A1GAAKDM4ETSHR
SCHEMBL24370669 0.81 CA1 (0.35) LMNAALDH1A1GAAKDM4ETSHR
SCHEMBL13615974 0.81 CA12 (0.55) LMNAALDH1A1GAATSHRMMP1
SCHEMBL5413453 0.81 GAA (0.35) LMNAALDH1A1GAAKDM4ETSHR
SCHEMBL23408430 0.81 DPP4 (0.38) LMNAALDH1A1GAAKDM4ETSHR
SCHEMBL18820958 0.81 DPP4 (0.38) LMNAALDH1A1GAAKDM4ETSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 391 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250354092-A1 CLEANING COMPOSITION AND METHOD FOR REMOVING POLYMER FILM BONDING MATERIALS USING THE SAME HONGYUE ADVANCED TECH CO LTD (TW) 2025-11-20 US claimed
CN-113462277-B Varnish composition and method for producing polyimide resin 东京应化工业株式会社 2024-04-19 CN claimed
US-11732214-B2 Cleaning agent composition comprising an alkylamide solvent and a fluorine-containing quaternary ammonium salt NISSAN CHEMICAL CORPORATION (JP) 2023-08-22 US claimed
US-20230002701-A1 CLEANING AGENT COMPOSITION AND CLEANING METHOD NISSAN CHEMICAL CORPORATION (JP) 2023-01-05 US claimed
CN-114730709-A Cleaning agent composition and cleaning method 日产化学株式会社 2022-07-08 CN claimed
CN-113462277-A Varnish composition and method for producing polyimide resin 东京应化工业株式会社 2021-10-01 CN claimed
US-8785443-B2 Methods of using prodrugs of methyl hydrogen fumarate and pharmaceutical compositions thereof XENOPORT, INC. (US) 2014-07-22 US claimed
US-20140057918-A1 Methods of Use for Monomethyl Fumarate and Prodrugs Thereof XENOPORT, INC. (US) 2014-02-27 US claimed
US-20100048651-A1 PRODRUGS OF METHYL HYDROGEN FUMARATE, PHARMACEUTICAL COMPOSITIONS THEREOF, AND METHODS OF USE XENOPORT, INC. (US) 2010-02-25 US claimed
CN-1953965-A Novel cis-imidazolines HOFFMANN LA ROCHE (CH) 2007-04-25 CN claimed
EP-0786483-B1 Process for an activated anionic lactam polymerisation INVENTA AG (CH) 2000-04-19 EP claimed
EP-0786483-A2 Process for an activated anionic lactam polymerisation EMS-INVENTA AG (CH) 1997-07-30 EP claimed
US-20260098188-A1 RELEASE AGENT COMPOSITION FOR LIGHT IRRADIATION RELEASE, AND ADHESIVE COMPOSITION FOR LIGHT IRRADIATION RELEASE NISSAN CHEMICAL CORPORATION (JP) 2026-04-09 US disclosed
EP-4685840-A1 RELEASE AGENT COMPOSITION FOR PHOTOIRRADIATION RELEASE, LAYERED PRODUCT, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE Nissan Chemical Corporation (JP) 2026-01-28 EP disclosed
US-20260022313-A1 METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE, AND RELEASING AND DISSOLVING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2026-01-22 US disclosed
US-20260022312-A1 METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE, AND RELEASING AND DISSOLVING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2026-01-22 US disclosed
US-5453439-A Antiinflammatory agent, antiallergen; lipoxygenase inhibitor ZENECA LIMITED (GB) 1995-09-26 US disclosed
US-5332757-A Enzyme inhibitors ZENECA LIMITED (GB) 1994-07-26 US disclosed
US-4714734-A POLYSILOXANE CONTAINING AROMATIC RING CONSTITUENT HAVING SMALL'S MOLECULAR ATTRACTION CONSTANT NOT SMALLER THAN 350 BRIDGESTONE CORP. (JP) 1987-12-22 US disclosed
US-4216172-A Preparation of cyclobutanones BAYER AKTIENGESELLSCHAFT (DE) 1980-08-05 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20140057918-A1 Methods of Use for Monomethyl Fumarate and Prodrugs Thereof FH, FAH, DHFR LMNA 2518/4885ALDH1A1 1063/4885GAA 1064/4885
US-20260022312-A1 METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE, AND RELEASING AND DISSOLVING COMPOSITION ASH2L, ITGAV, AS3MT LMNA 1276/4885ALDH1A1 3448/4885GAA 1678/4885
US-20260098188-A1 RELEASE AGENT COMPOSITION FOR LIGHT IRRADIATION RELEASE, AND ADHESIVE COMPOSITION FOR LIGHT IRRADIATION RELEASE ERCC1, SMC2, SMC3 LMNA 100/4885ALDH1A1 622/4885GAA 2769/4885
US-20100048651-A1 PRODRUGS OF METHYL HYDROGEN FUMARATE, PHARMACEUTICAL COMPOSITIONS THEREOF, AND METHODS OF USE FH, MGMT, BHMT2 LMNA 4568/4885ALDH1A1 2050/4885GAA 3941/4885
US-20260022313-A1 METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE, AND RELEASING AND DISSOLVING COMPOSITION ASH2L, VCL, ILK LMNA 1416/4885ALDH1A1 1226/4885GAA 2142/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.