SCHEMBL3208782

SCHEMBL3208782

O=C(Oc1ccc([S+](c2ccccc2)c2ccc(OC(=O)c3ccccc3)cc2)cc1)c1ccccc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PARP10 Q53GL7 1/20 0.61
KMT2A Q03164 11/20 0.57
MAPT P10636 5/20 0.57
TDP1 Q9NUW8 3/20 0.57
ALDH1A1 P00352 2/20 0.57
L3MBTL1 Q9Y468 1/20 0.57
PKM P14618 1/20 0.57
MEN1 O00255 3/20 0.56
RAB9A P51151 1/20 0.54
ELANE P08246 1/20 0.50
CASP3 P42574 1/20 0.49
SENP7 Q9BQF6 1/20 0.49
HSD17B10 Q99714 1/20 0.48
KDM4E B2RXH2 1/20 0.48
GAA P10253 1/20 0.48
NSD2 O96028 1/20 0.47
F2 P00734 1/20 0.47
LMNA P02545 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
PRSS1 P07477 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3198779 1.00 PARP10 (0.61) PARP10KMT2AMAPTTDP1ALDH1A1
SCHEMBL3201074 0.98 PARP10 (0.62) PARP10KMT2AMAPTTDP1ALDH1A1
SCHEMBL725405 0.86 PARP10 (0.77) PARP10KMT2AMAPTTDP1ALDH1A1
SCHEMBL12376716 0.85 ELANE (0.64) PARP10KMT2AMAPTTDP1ALDH1A1
SCHEMBL12376686 0.85 KMT2A (0.51) PARP10KMT2AMAPTTDP1ALDH1A1
SCHEMBL9663679 0.84 PARP10 (0.81) PARP10KMT2AMAPTTDP1ALDH1A1
Hydrochloric Acid SCHEMBL16050040 0.84 PARP10 (0.74) PARP10KMT2AMAPTTDP1ALDH1A1
SCHEMBL8205435 0.82 PARP10 (0.78) PARP10KMT2AMAPTTDP1ALDH1A1
SCHEMBL1870544 0.82 PARP10 (0.70) PARP10KMT2AMAPTTDP1ALDH1A1
SCHEMBL31888 0.82 PARP10 (0.70) PARP10KMT2AMAPTTDP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180011401-A1 SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD TOYO GOSEI CO., LTD. (JP) 2018-01-11 US disclosed
US-9714217-B2 Sulfonic acid derivative and photoacid generator TOYO GOSEI CO., LTD. (JP) 2017-07-25 US disclosed
US-20130130175-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method CENTRAL GLASS COMPANY, LIMITED (JP) 2013-05-23 US disclosed
US-8435717-B2 Compound for photoacid generator, resist composition using the same, and pattern-forming method CENTRAL GLASS COMPANY, LIMITED (JP) 2013-05-07 US disclosed
US-20120289738-A1 SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR TOYO GOSEI CO., LTD. (JP) 2012-11-15 US disclosed
US-20100035185-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method CENTRAL GLASS COMPANY, LTD. (JP) 2010-02-11 US disclosed
US-7414148-B2 Process for producing alkoxycarbonylfluoroalkanesulfonates CENTRAL GLASS COMPANY LIMITED (JP) 2008-08-19 US disclosed
US-20080108846-A1 PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES CENTRAL GLASS COMPANY, LIMITED (JP) 2008-05-08 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180011401-A1 SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD ASIC1, ASIC3, CRY1 PARP10 4177/4885KMT2A 503/4885MAPT 4292/4885
US-20080108846-A1 PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES ARSA, PFAS, MPST PARP10 4153/4885KMT2A 3530/4885MAPT 4791/4885
US-20100035185-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method ASIC1, RER1, INSRR PARP10 2696/4885KMT2A 2194/4885MAPT 4347/4885
US-20120289738-A1 SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR CRY1, ASIC1, ASIC3 PARP10 2786/4885KMT2A 2109/4885MAPT 3875/4885
US-20130130175-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method ASIC1, RER1, INSRR PARP10 2610/4885KMT2A 2323/4885MAPT 4438/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.