Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 8/20 | 0.53 |
| ▸ | THRA | P10827 | 7/20 | 0.53 |
| ▸ | PPARA | Q07869 | 1/20 | 0.49 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | ESR1 | P03372 | 2/20 | 0.42 |
| ▸ | ADRA2A | P08913 | 2/20 | 0.42 |
| ▸ | ADORA3 | P0DMS8 | 2/20 | 0.42 |
| ▸ | TACR2 | P21452 | 2/20 | 0.42 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.42 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.42 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | SHBG | P04278 | 1/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.42 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7890605 | 0.89 | THRB (0.47) | THRBTHRAPPARAKMT2AALDH1A1 | |
| SCHEMBL8432915 | 0.83 | THRB (0.43) | THRBTHRAPPARAKMT2AALDH1A1 | |
| SCHEMBL7556232 | 0.82 | THRB (0.51) | THRBTHRAPPARAMEN1KMT2A | |
| SCHEMBL13397686 | 0.82 | THRB (0.51) | THRBTHRAPPARAMEN1KMT2A | |
| SCHEMBL4161347 | 0.82 | POLB (0.45) | PPARAKMT2AMAPT | |
| SCHEMBL3411458 | 0.82 | THRB (0.67) | THRBTHRAPPARAMEN1KMT2A | |
| SCHEMBL7564773 | 0.82 | ELANE (0.41) | KMT2AALDH1A1MAPT | |
| SCHEMBL4457165 | 0.81 | THRB (0.64) | THRBTHRAMEN1KMT2AALDH1A1 | |
| SCHEMBL28433166 | 0.81 | THRB (0.64) | THRBTHRAMEN1KMT2AALDH1A1 | |
| SCHEMBL12991076 | 0.81 | THRB (0.64) | THRBTHRAMEN1KMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3018118-B1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2023-07-05 | — | — | EP | disclosed |
| CN-112968108-B | Transfer method of light-emitting structure | 重庆康佳光电技术研究院有限公司 | 2022-07-29 | — | — | CN | disclosed |
| CN-112968108-A | Transfer method of light-emitting structure | 重庆康佳光电技术研究院有限公司 | 2021-06-15 | — | — | CN | disclosed |
| CN-107300831-B | Curable composition applied to LED photocuring | 常州强力电子新材料股份有限公司 | 2021-01-15 | — | — | CN | disclosed |
| CN-107848963-B | Acid-resistant alkali-producing agent and/or radical-producing agent, and curable resin composition containing same | 富士胶片和光纯药株式会社 | 2020-11-03 | — | — | CN | disclosed |
| EP-3327002-B1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2020-08-19 | — | — | EP | disclosed |
| CN-111324009-A | Photocurable composition and use thereof | 常州强力先端电子材料有限公司 | 2020-06-23 | — | — | CN | disclosed |
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-01 | — | — | US | disclosed |
| US-10428014-B2 | Base generator, base-reactive composition containing said base generator, and base generation method | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-01 | — | — | US | disclosed |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| EP-3018118-A1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | Wako Pure Chemical Industries, Ltd. (JP) | 2016-05-11 | — | — | EP | disclosed |
| US-20160122292-A1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2016-05-05 | — | — | US | disclosed |
| US-8378002-B2 | Aqueous ink composition, aqueous ink composition for inkjet recording, and inkjet recording method | FUJIFILM CORPORATION (JP) | 2013-02-19 | — | — | US | disclosed |
| US-20100015360-A1 | AQUEOUS INK COMPOSITION, AQUEOUS INK COMPOSITION FOR INKJET RECORDING, AND INKJET RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2010-01-21 | — | — | US | disclosed |
| EP-2145932-A1 | Aqueous ink composition, aqueous ink composition for inkjet recording, and inkjet recording method | Fujifilm Corporation (JP) | 2010-01-20 | — | — | EP | disclosed |
| US-7217743-B2 | Curable white ink | KONICA CORPORATION (JP) | 2007-05-15 | — | — | US | disclosed |
| US-6900250-B2 | Polymerizable composition | TOYO INK MFG. CO., LTD. (JP) | 2005-05-31 | — | — | US | disclosed |
| US-20040019128-A1 | Curable white ink | KONICA CORPORATION (JP) | 2004-01-29 | — | — | US | disclosed |
| US-20030212162-A1 | Photopolymerization using photoinitiators | TOYO INK MFG. CO., LTD. (JP) | 2003-11-13 | — | — | US | disclosed |
| US-4789620-A | CROSSLINKED, CURED COATING | MITSUBISHI RAYON CO. LTD. (JP) | 1988-12-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | REV1, RER1, CBR1 | THRB 2566/4885THRA 1105/4885PPARA 2834/4885 |
| US-10428014-B2 | Base generator, base-reactive composition containing said base generator, and base generation method | HPRT1, GNG2, BLM | THRB 3306/4885THRA 3148/4885PPARA 3591/4885 |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | REV1, RER1, CBR1 | THRB 2566/4885THRA 1105/4885PPARA 2834/4885 |
| US-20160122292-A1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | GNG2, EPHX2, ARHGEF1 | THRB 3704/4885THRA 3231/4885PPARA 3175/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.