SCHEMBL3481787

SCHEMBL3481787

CCO[SiH2]c1ccc(C)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE P22303 5/20 0.38
TDP1 Q9NUW8 1/20 0.38
AGXT P21549 2/20 0.33
CA2 P00918 2/20 0.32
IDO1 P14902 1/20 0.32
LPL P06858 1/20 0.32
LIPG Q9Y5X9 1/20 0.32
ORAI1 Q96D31 1/20 0.32
ORAI2 Q96SN7 1/20 0.32
ORAI3 Q9BRQ5 1/20 0.32
TRPV6 Q9H1D0 1/20 0.32
GAA P10253 1/20 0.32
HTT P42858 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
ALDH1A1 P00352 2/20 0.31
CYP3A4 P08684 1/20 0.31
CYP2C9 P11712 1/20 0.31
CYP2C19 P33261 1/20 0.31
MAPT P10636 1/20 0.31
CA1 P00915 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3481941 0.82 ACHE (0.35) ACHETDP1AGXTCA2IDO1
SCHEMBL3481907 0.79 LPL (0.41) TDP1CA2IDO1LPLLIPG
SCHEMBL31416082 0.79 LMNA (0.36) TDP1AGXTIDO1GAASMN1; SMN2
SCHEMBL2804398 0.79 TDP1 (0.46) ACHETDP1GAAALDH1A1CYP3A4
SCHEMBL703521 0.78 LTA4H (0.37) ALDH1A1
SCHEMBL28164375 0.77 CA1 (0.48) ACHETDP1AGXTCA2IDO1
SCHEMBL3482009 0.76 ALDH1A1 (0.32) ALDH1A1
SCHEMBL27999545 0.76 HRH3 (0.41) CA2CA1CA7CA9
SCHEMBL29159188 0.74
Ethyne SCHEMBL28268842 0.74 LTA4H (0.34) ACHEALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112996841-B Crosslinkable organosiloxane compositions 瓦克化学股份公司 2022-12-27 CN disclosed
CN-112996841-A Crosslinkable organosiloxane compositions 瓦克化学股份公司 2021-06-18 CN disclosed
EP-2128897-B1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LTD (JP) 2015-05-06 EP disclosed
CN-102834420-B Internal and external donor compounds for olefin polymerization catalysts ii BASF CORP. (US) 2014-10-22 CN disclosed
US-8716209-B2 Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device FUJITSU LIMITED (JP) 2014-05-06 US disclosed
CN-102834420-A Internal and external donor compounds for olefin polymerization catalysts ii BASF CORP 2012-12-19 CN disclosed
US-20100007031-A1 AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2010-01-14 US disclosed
EP-2128897-A1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE Fujitsu Limited (JP) 2009-12-02 EP disclosed
CN-1040988-C Thermoplastic elastomer compositions MITSUI PETROCHEMICAL IND (JP) 1998-12-02 CN disclosed
CN-1036216-A Composition for thermoplastic elastomer MITSUI PETROCHEMICAL IND (JP) 1989-10-11 CN disclosed