Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.32 |
| ▸ | TSHR | P16473 | 3/20 | 0.32 |
| ▸ | PIK3CA | P42336 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.32 |
| ▸ | GAA | P10253 | 2/20 | 0.32 |
| ▸ | CA1 | P00915 | 2/20 | 0.32 |
| ▸ | CA2 | P00918 | 2/20 | 0.32 |
| ▸ | HPGD | P15428 | 2/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL29486332 | 1.00 | ALDH1A1 (0.38) | ALDH1A1LMNATRPA1ATMSMN1; SMN2 | |
| Sulfuric Acid SCHEMBL2386170 | 0.86 | ALDH1A1 (0.41) | ALDH1A1MAPTTDP1CYP3A4TSHR | |
| Sulfuric Acid SCHEMBL17847416 | 0.86 | ALDH1A1 (0.41) | ALDH1A1MAPTTDP1CYP3A4TSHR | |
| SCHEMBL11650509 | 0.84 | KEAP1 (0.42) | ALDH1A1MAPTTDP1CYP3A4TSHR | |
| Trifluoromethanesulfonic Acid SCHEMBL1005216 | 0.84 | TRPA1 (0.45) | ALDH1A1TRPA1ATMMAPTTDP1 | |
| SCHEMBL5150922 | 0.79 | ALDH1A1 (0.36) | ALDH1A1LMNAMAPTTDP1CYP3A4 | |
| Trifluoroacetic Acid SCHEMBL4452739 | 0.79 | TDP1 (0.37) | ALDH1A1LMNASMN1; SMN2MAPTTDP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL29965296 | 0.78 | TRPA1 (0.33) | ALDH1A1TRPA1ATMSMN1; SMN2MAPT | |
| Sulfuric Acid SCHEMBL2561125 | 0.77 | ALDH1A1 (0.46) | ALDH1A1SMN1; SMN2MAPTTDP1CYP3A4 | |
| SCHEMBL33509 | 0.77 | CYP3A4 (0.50) | ALDH1A1SMN1; SMN2MAPTTDP1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112110800-B | 3-aryl-2-propyne-1-alcohol derivative and preparation method thereof | 哈尔滨工业大学（深圳） | 2022-06-24 | — | — | CN | claimed |
| CN-112110800-A | 3-aryl-2-propyne-1-alcohol derivative and preparation method thereof | 哈尔滨工业大学（深圳） | 2020-12-22 | — | — | CN | claimed |
| CN-1887829-A | Synthesis process of 18F lebeled positive electron radioactive tracer with ionic liquid as phase transfer catalyst | GUO QIYONG (CN) | 2007-01-03 | — | — | CN | claimed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12332567-B2 | Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-06-17 | — | — | US | disclosed |
| US-12174541-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-12-24 | — | — | US | disclosed |
| US-20240319598-A1 | Composition For Forming Silicon-Containing Resist Underlayer Film And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-09-26 | — | — | US | disclosed |
| EP-4435515-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-09-25 | — | — | EP | disclosed |
| US-12085857-B2 | Composition for forming silicon-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-09-10 | — | — | US | disclosed |
| EP-3770209-B1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2024-09-04 | — | — | EP | disclosed |
| EP-3680275-B1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2024-03-06 | — | — | EP | disclosed |
| CN-111208710-A | Iodine-containing thermosetting silicon-containing material, resist underlayer film-forming composition for extreme ultraviolet lithography containing the same, and pattern formation method | 信越化学工业株式会社 | 2020-05-29 | — | — | CN | disclosed |
| EP-3657254-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2020-05-27 | — | — | EP | disclosed |
| US-20200159120-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-05-21 | — | — | US | disclosed |
| EP-3174854-A1 | METHOD OF PREPARING FLUORINE-18 LABELED CABOZANTINIB AND ITS ANALOGS | Exelixis, Inc. (US) | 2017-06-07 | — | — | EP | disclosed |
| WO-2016019285-A1 | METHOD OF PREPARING FLUORINE-18 LABELED CABOZANTINIB AND ITS ANALOGS | EXELIXIS, INC. (US) | 2016-02-04 | — | — | WO | disclosed |
| EP-2164590-A1 | METHOD FOR THE DIRECT ELUTION OF REACTIVE 18F FLUORIDE FROM AN ANION EXCHANGE RESIN IN AN ORGANIC MEDIUM SUITABLE FOR RADIOLABELLING WITHOUT ANY EVAPORATION STEP BY THE USE OF STRONG ORGANIC BASES | Trasis S.A. (BE) | 2010-03-24 | — | — | EP | disclosed |
| CN-100560549-C | Utilize ionic liquid synthetic as phase-transfer catalyst 18The method of F mark positron radioactivity tracer agent | GUO QIYONG THE SECOND HOSPITAL (CN) | 2009-11-18 | — | — | CN | disclosed |
| WO-2009003251-A1 | METHOD FOR THE DIRECT ELUTION OF REACTIVE 18F FLUORIDE FROM AN ANION EXCHANGE RESIN IN AN ORGANIC MEDIUM SUITABLE FOR RADIOLABELLING WITHOUT ANY EVAPORATION STEP BY THE USE OF STRONG ORGANIC BASES | TRASIS S.A. (BE) | 2009-01-08 | — | — | WO | disclosed |
| CN-1887829-A | Synthesis process of 18F lebeled positive electron radioactive tracer with ionic liquid as phase transfer catalyst | GUO QIYONG (CN) | 2007-01-03 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200159120-A1 | THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION CONTAINING THE MATERIAL FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY, AND PATTERNING PROCESS | RPS4X, SIK3, MLX | ALDH1A1 4644/4885LMNA 2563/4885TRPA1 2908/4885 |
| US-12332567-B2 | Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound | SMC1A, CDH1, SMC4 | ALDH1A1 1586/4885LMNA 1437/4885TRPA1 3632/4885 |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | ALDH1A1 4452/4885LMNA 755/4885TRPA1 4246/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.