SCHEMBL3707569

SCHEMBL3707569

O=S(=O)(OS(c1ccccc1)(c1ccccc1)c1ccccc1)C(F)(F)C(F)(F)C1C2CCC1CC2

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PSEN1 P49768 3/20 0.34
PSEN2 P49810 3/20 0.34
APH1B Q8WW43 3/20 0.34
NCSTN Q92542 3/20 0.34
APH1A Q96BI3 3/20 0.34
PSENEN Q9NZ42 3/20 0.34
LIPE Q05469 1/20 0.34
MAPT P10636 1/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
NR1H3 Q13133 1/20 0.33
ALOX15 P16050 1/20 0.33
HSD11B1 P28845 1/20 0.32
GCK P35557 1/20 0.32
APOBEC3A P31941 1/20 0.31
APOBEC3G Q9HC16 1/20 0.31
GBA1 P04062 1/20 0.31
PKM P14618 1/20 0.31
LMNA P02545 1/20 0.31
NPC1 O15118 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL383094 0.84 L3MBTL1 (0.35) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL2437767 0.79 HTR6 (0.38) MAPTNR1H3HSD11B1APOBEC3GLMNA
SCHEMBL962839 0.79 HSD11B1 (0.41) MEN1KMT2ANR1H3HSD11B1APOBEC3G
SCHEMBL217002 0.79 HTR6 (0.38) MAPTNR1H3HSD11B1APOBEC3GLMNA
SCHEMBL2536185 0.78 HSD11B1 (0.31) LIPEMAPTNR1H3HSD11B1GCK
SCHEMBL448749 0.78 NPY2R (0.35) MAPTKMT2ALMNAALDH1A1
SCHEMBL37033 0.76 HTR6 (0.42) MAPTNR1H3HSD11B1APOBEC3GLMNA
SCHEMBL2797827 0.76 HSD11B1 (0.39) HSD11B1LMNA
SCHEMBL2537689 0.76 ALDH1A1 (0.31) MAPTALDH1A1
SCHEMBL965951 0.76 CA1 (0.39) MEN1KMT2ANR1H3HSD11B1APOBEC3G

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130164680-A1 PHOTORESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-06-27 US disclosed
WO-2012067755-A2 PHOTORESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-05-24 WO disclosed
US-20120122031-A1 PHOTORESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-05-17 US disclosed