Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPY2R | P49146 | 1/20 | 0.35 |
| ▸ | PTGS2 | P35354 | 6/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | NR1H2 | P55055 | 3/20 | 0.32 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | DRD1 | P21728 | 1/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL383094 | 0.93 | L3MBTL1 (0.35) | LMNAHTTSLC6A3L3MBTL1MAPT | |
| SCHEMBL2797827 | 0.89 | HSD11B1 (0.39) | LMNA | |
| SCHEMBL447066 | 0.85 | LMNA (0.39) | LMNAHTTMAPTKMT2AKDM4E | |
| SCHEMBL2799411 | 0.84 | HSD11B1 (0.42) | LMNA | |
| Diphenylsulfane SCHEMBL5648328 | 0.81 | NPY2R (0.35) | NPY2RPTGS2MAPTKMT2AALDH1A1 | |
| SCHEMBL3707569 | 0.78 | PSEN1 (0.34) | LMNAMAPTKMT2AALDH1A1 | |
| SCHEMBL448748 | 0.77 | ALDH1A1 (0.33) | NPY2RPTGS2LMNAHTTSLC6A3 | |
| SCHEMBL2539894 | 0.75 | — | — | |
| SCHEMBL444803 | 0.75 | PTGS2 (0.44) | PTGS2DRD1 | |
| SCHEMBL3792312 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 190 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12631962-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| US-12624392-B2 | Molecular array generation using photoresist | 10X GENOMICS, INC. (US) | 2026-05-12 | — | — | US | disclosed |
| US-12393115-B2 | Positive working photosensitive material | MERCK PATENT GMBH (DE) | 2025-08-19 | — | — | US | disclosed |
| EP-4516394-A2 | HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST | 10x Genomics, Inc. (US) | 2025-03-05 | — | — | EP | disclosed |
| WO-2024176973-A1 | METHOD FOR PRODUCING PURIFIED RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND PURIFIED RESIST COMPOSITION | 東京応化工業株式会社 | 2024-08-29 | — | — | WO | disclosed |
| US-20240231231-A1 | METHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION, AND RESIST UNDERLAYER FILM | JSR CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-20240167077-A1 | COVALENT ATTACHMENT OF SPLINT OLIGONUCLEOTIDES FOR MOLECULAR ARRAY GENERATION USING LIGATION | 10X GENOMICS, INC. (US) | 2024-05-23 | — | — | US | disclosed |
| US-20240076656-A1 | HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST | 10X GENOMICS, INC. (US) | 2024-03-07 | — | — | US | disclosed |
| US-20240060127-A1 | METHODS AND SYSTEMS FOR LIGHT-CONTROLLED SURFACE PATTERNING USING PHOTOMASKS | 10X GENOMICS, INC. | 2024-02-22 | — | — | US | disclosed |
| US-20230408917-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-12-21 | — | — | US | disclosed |
| EP-2444845-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2012-04-25 | — | — | EP | disclosed |
| US-20120082936-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20120065291-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2012-03-15 | — | — | US | disclosed |
| US-20110076619-A1 | METHOD FOR MODIFYING FIRST FILM AND COMPOSITION FOR FORMING ACID TRANSFER RESIN FILM USED THEREFOR | JSR CORPORATION (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20110027718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2011-02-03 | — | — | US | disclosed |
| US-20100190109-A1 | ACID TRANSFER COMPOSITION, ACID TRANSFER FILM, AND PATTERN FORMING METHOD | JSR CORPORATION (JP) | 2010-07-29 | — | — | US | disclosed |
| US-20090053649-A1 | Lactone copolymer and radiation-sensitive resin composition | JSR CORPORATION | 2009-02-26 | — | — | US | disclosed |
| EP-1757628-A1 | LACTONE COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2007-02-28 | — | — | EP | disclosed |
| EP-1757980-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2007-02-28 | — | — | EP | disclosed |
| US-20070042292-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2007-02-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12631962-B2 | Resist composition and method for forming resist pattern | TERB1, TERF2, LSM8 | NPY2R 1331/4885PTGS2 2352/4885LMNA 1064/4885 |
| US-12624392-B2 | Molecular array generation using photoresist | POLL, LIG4, LIG3 | NPY2R 1258/4885PTGS2 3407/4885LMNA 637/4885 |
| US-20110027718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND | SMARCC1, RXRA, RXRB | NPY2R 2886/4885PTGS2 4163/4885LMNA 1276/4885 |
| US-20120065291-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND | RAD51, RER1, XRCC5 | NPY2R 1408/4885PTGS2 2958/4885LMNA 1547/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.