SCHEMBL3936737

SCHEMBL3936737

O=S(=O)([O-])c1ccccc1/C=C/c1ccccc1S(=O)(=O)[O-].[Na+].[Na+]

nearest known ligand 0.50

Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB known ✓ P10828 1/20 0.40
RAD51 Q06609 9/20 0.50
TDP1 Q9NUW8 3/20 0.46
KDM4E B2RXH2 2/20 0.46
USP2 O75604 2/20 0.46
ALDH1A1 P00352 2/20 0.46
LTA P01374 2/20 0.46
CYP3A4 P08684 2/20 0.46
MAPT P10636 2/20 0.46
HPGD P15428 2/20 0.46
P2RX3 P56373 2/20 0.46
HSD17B10 Q99714 2/20 0.46
STS P08842 1/20 0.40
MEN1 O00255 1/20 0.40
LMNA P02545 1/20 0.40
BLM P54132 1/20 0.40
KMT2A Q03164 1/20 0.40
PKLR P30613 2/20 0.39
HTR2A P28223 1/20 0.38
DUSP5 Q16690 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29404354 1.00 RAD51 (0.50) RAD51TDP1KDM4EUSP2ALDH1A1
SCHEMBL6345692 1.00 RAD51 (0.50) RAD51TDP1KDM4EUSP2ALDH1A1
SCHEMBL31427086 1.00 RAD51 (0.50) RAD51TDP1KDM4EUSP2ALDH1A1
Water SCHEMBL28891479 0.98 RAD51 (0.53) RAD51TDP1KDM4EUSP2ALDH1A1
SCHEMBL20481086 0.92 RAD51 (0.45) RAD51TDP1KDM4EUSP2ALDH1A1
SCHEMBL27453977 0.90 RAD51 (0.48) RAD51TDP1KDM4EUSP2ALDH1A1
SCHEMBL183119 0.87 RAD51 (0.42) RAD51TDP1KDM4EUSP2ALDH1A1
SCHEMBL15788912 0.87 RAD51 (0.42) RAD51TDP1KDM4EUSP2ALDH1A1
SCHEMBL29384434 0.87 RAD51 (0.42) RAD51TDP1KDM4EUSP2ALDH1A1
SCHEMBL15769461 0.87 RAD51 (0.42) RAD51TDP1KDM4EUSP2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120059168-A Dyeing auxiliary and easy-to-dye polyurethane urea elastic fiber containing same 华峰化学股份有限公司 2025-05-30 CN claimed
CN-119708965-A Plasma cutting protection liquid and preparation method and application thereof 深圳市化讯半导体材料有限公司 2025-03-28 CN claimed
CN-119661992-A Low-temperature extinction transparent polyester resin composition, and preparation method and application thereof 擎天材料科技有限公司 2025-03-21 CN claimed
CN-115506030-B Monocrystalline silicon wet etching texturing additive, monocrystalline silicon wet etching texturing liquid containing monocrystalline silicon wet etching texturing additive, preparation method and application of monocrystalline silicon wet etching texturing additive 浙江奥首材料科技有限公司 2024-02-27 CN claimed
CN-115584662-B Paper-plastic protection piece for furniture corner positions, preparation method and paper-plastic protection assembly structure 东莞市加隆纸塑包装有限公司 2023-10-27 CN claimed
CN-120059168-A Dyeing auxiliary and easy-to-dye polyurethane urea elastic fiber containing same 华峰化学股份有限公司 2025-05-30 CN disclosed
CN-119661992-A Low-temperature extinction transparent polyester resin composition, and preparation method and application thereof 擎天材料科技有限公司 2025-03-21 CN disclosed
CN-115506030-B Monocrystalline silicon wet etching texturing additive, monocrystalline silicon wet etching texturing liquid containing monocrystalline silicon wet etching texturing additive, preparation method and application of monocrystalline silicon wet etching texturing additive 浙江奥首材料科技有限公司 2024-02-27 CN disclosed
CN-115506030-B Monocrystalline silicon wet etching texturing additive, monocrystalline silicon wet etching texturing liquid containing monocrystalline silicon wet etching texturing additive, preparation method and application of monocrystalline silicon wet etching texturing additive 浙江奥首材料科技有限公司 2024-02-27 CN disclosed
CN-115584662-B Paper-plastic protection piece for furniture corner positions, preparation method and paper-plastic protection assembly structure 东莞市加隆纸塑包装有限公司 2023-10-27 CN disclosed
US-11753608-B2 Water-soluble unit dose articles comprising perfume THE PROCTER & GAMBLE COMPANY (US) 2023-09-12 US disclosed
US-20210238513-A1 WATER-SOLUBLE UNIT DOSE ARTICLES COMPRISING PERFUME PROCTER & GAMBLE (US) 2021-08-05 US disclosed
WO-2009017288-A1 PROCESS FOR PREPARATION OF DISODIUM STILBENEDISULFONATES SK ENERGY CO., LTD. (KR) 2009-02-05 WO disclosed