SCHEMBL397454

SCHEMBL397454

C=CC(=O)NCc1cccc(S(=O)(=O)N(C)C)c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 3/20 0.52
NPC1 O15118 2/20 0.52
TNF P01375 1/20 0.52
NOD1 Q9Y239 1/20 0.52
MEN1 O00255 4/20 0.51
KMT2A Q03164 4/20 0.51
ALDH1A1 P00352 6/20 0.50
TP53 P04637 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
KDM4E B2RXH2 2/20 0.49
CCR1 P32246 1/20 0.46
NAMPT P43490 1/20 0.46
HSD17B10 Q99714 1/20 0.46
POLB P06746 1/20 0.44
TGM2 P21980 1/20 0.44
LMNA P02545 1/20 0.44
KCNJ6 P48051 1/20 0.44
KCNJ5 P48544 1/20 0.44
KCNJ3 P48549 1/20 0.44
RXFP1 Q9HBX9 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL397215 0.87 POLB (0.60) RAB9AMEN1KMT2AALDH1A1SMN1; SMN2
SCHEMBL437691 0.83 ALDH1A1 (0.57) MEN1KMT2AALDH1A1SMN1; SMN2NAMPT
SCHEMBL393894 0.83 FBP1 (0.49) ALDH1A1CCR1HSD17B10POLBTGM2
SCHEMBL396034 0.82 ALDH1A1 (0.49) MEN1KMT2AALDH1A1KDM4EPOLB
SCHEMBL393849 0.81 ALDH1A1 (0.47) RAB9AALDH1A1CCR1NAMPTTGM2
SCHEMBL732581 0.80 TGM2 (0.61) MEN1KMT2AALDH1A1KDM4EPOLB
SCHEMBL7751005 0.80 CCR1 (0.48) ALDH1A1KDM4ECCR1NAMPTTGM2
SCHEMBL397300 0.80 SMN1; SMN2 (0.50) RAB9ANPC1MEN1KMT2AALDH1A1
SCHEMBL394316 0.79 FBP1 (0.45) KMT2AALDH1A1NAMPTTGM2LMNA
SCHEMBL7754578 0.78 FBP1 (0.44) RAB9AMEN1KMT2AALDH1A1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120146264-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND PROCESS FOR MAKING RELIEF PRINTING PLATE FUJIFILM CORPORATION (JP) 2012-06-14 US disclosed
US-8101332-B2 Negative-working lithographic printing plate precursor and method of lithographic printing using same FUJIFILM CORPORATION (JP) 2012-01-24 US disclosed
EP-1972440-B1 Negative lithographic printing plate precursor and lithographic printing method using the same FUJIFILM CORP (JP) 2010-06-23 EP disclosed
US-20090246688-A1 NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF LITHOGRAPHIC PRINTING USING SAME FUJIFILM CORPORATION (JP) 2009-10-01 US disclosed
EP-2105298-A1 Negative-working lithographic printing plate precursor and method of lithographic printing using same Fujifilm Corporation (JP) 2009-09-30 EP disclosed
US-20080233516-A1 NEGATIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-09-25 US disclosed
EP-1972440-A2 Negative lithographic printing plate precursor and lithographic printing method using the same FUJIFILM Corporation (JP) 2008-09-24 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120146264-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND PROCESS FOR MAKING RELIEF PRINTING PLATE EIF3L, EIF2B1, EIF2B5 RAB9A 2814/4885NPC1 4767/4885TNF 2781/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.