Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.38 |
| ▸ | TSHR | P16473 | 3/20 | 0.36 |
| ▸ | MGAM | O43451 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | SI | P14410 | 1/20 | 0.36 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | FOLH1 | Q04609 | 2/20 | 0.32 |
| ▸ | NAALAD2 | Q9Y3Q0 | 2/20 | 0.32 |
| ▸ | MMP1 | P03956 | 1/20 | 0.32 |
| ▸ | MMP2 | P08253 | 1/20 | 0.32 |
| ▸ | MMP3 | P08254 | 1/20 | 0.32 |
| ▸ | USP2 | O75604 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | KDM6B | O15054 | 1/20 | 0.32 |
| ▸ | KDM5C | P41229 | 1/20 | 0.32 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.32 |
| ▸ | PHF8 | Q9UPP1 | 1/20 | 0.32 |
| ▸ | KDM2A | Q9Y2K7 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15992208 | 0.86 | MMP1 (0.41) | ALDH1A1TSHRFOLH1NAALAD2MMP1 | |
| SCHEMBL11053890 | 0.80 | TSHR (0.31) | TSHRFOLH1NAALAD2MMP1MMP2 | |
| SCHEMBL409846 | 0.79 | MMP1 (0.37) | TSHRFOLH1NAALAD2MMP1MMP2 | |
| SCHEMBL518088 | 0.79 | LDHA (0.40) | ALDH1A1TDP1FOLH1NAALAD2 | |
| SCHEMBL24810663 | 0.77 | CA1 (0.33) | TSHRGAAFOLH1NAALAD2MMP1 | |
| SCHEMBL20363804 | 0.77 | USP2 (0.41) | TSHRHTTFOLH1NAALAD2MMP1 | |
| SCHEMBL12757329 | 0.77 | ALDH1A1 (0.50) | ALDH1A1TDP1TSHRHSD17B10 | |
| SCHEMBL15658171 | 0.77 | TDP1 (0.43) | ALDH1A1TDP1TSHRFOLH1NAALAD2 | |
| SCHEMBL8773200 | 0.77 | CA1 (0.47) | ALDH1A1CA1CA2 | |
| SCHEMBL1935489 | 0.76 | TSHR (0.44) | ALDH1A1TDP1TSHRMGAMGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 268 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108341836-B | The monomer and its polymer of boronic acid containing and dihydropyridine structure | 清华大学 | 2019-06-07 | — | — | CN | claimed |
| CN-108341836-A | The monomer and its polymer of boronic acid containing and dihydropyridine structure | 清华大学 | 2018-07-31 | — | — | CN | claimed |
| CN-108191771-A | A kind of 3,4- dihydropyrimidine-2-ketos class function monomer and polymer and its their preparation method | 清华大学 | 2018-06-22 | — | — | CN | claimed |
| CN-105693962-B | The preparation method of gold nanorods and polymer hybrid material with self-healing properties | 厦门大学 | 2018-01-12 | — | — | CN | claimed |
| CN-106084932-A | A kind of weather-proof metallized coating of photo frame high rigidity | 蚌埠市禹会区贵宾装饰材料商行 | 2016-11-09 | — | — | CN | claimed |
| US-8541615-B2 | Method for producing biphenyltetracarboxylic acid tetraester | UBE INDUSTRIES, LTD. (JP) | 2013-09-24 | — | — | US | claimed |
| US-20130115367-A1 | METHOD FOR FORMING RUTHENIUM OXIDE FILM | TOKYO ELECTRON LIMITED (JP) | 2013-05-09 | — | — | US | claimed |
| US-20110137069-A1 | METHOD FOR PRODUCING BIPHENYLTETRACARBOXYLIC ACID TETRAESTER | UBE INDUSTRIES, LTD. (JP) | 2011-06-09 | — | — | US | claimed |
| US-20060148193-A1 | Methods for forming ruthenium films with beta-diketone containing ruthenium complexes and method for manufacturing metal-insulator-metal capacitor using the same | SAMSUNG ELECTRONICS CO., LTD. | 2006-07-06 | — | — | US | claimed |
| US-7049232-B2 | Methods for forming ruthenium films with β-diketone containing ruthenium complexes and method for manufacturing metal-insulator-metal capacitor using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-05-23 | — | — | US | claimed |
| US-20040166671-A1 | Methods for forming ruthenium films with beta-diketone containing ruthenium complexes and method for manufacturing metal-insulator-metal capacitor using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-08-26 | — | — | US | claimed |
| US-6743934-B2 | SUCH AS BIS(6-METHYL-2,4-HEPTANEDIONATE)(1,5-CYCLOOCTADIENE) RUTHENIUM | TANAKA KIKINZOKU KOGYO K.K. (JP) | 2004-06-01 | — | — | US | claimed |
| US-20030203102-A1 | Raw material compounds for use in CVD, and chemical vapor depsoition of ruthenium compound thin films | TANAKA KIKINZOKU KOGYO K.K. (JP) | 2003-10-30 | — | — | US | claimed |
| CN-1451780-A | Feed stock compound for CVD and process for CVD of ruthenium or ruthenium compound film | TANAKA PRECIOUS METAL IND (JP) | 2003-10-29 | — | — | CN | claimed |
| US-12630570-B2 | Organometallic adduct compound and method of manufacturing integrated circuit device by using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-05-19 | — | — | US | disclosed |
| CN-115362157-B | Zinc compound, raw material for forming thin film, and method for producing same | 株式会社ADEKA | 2026-05-15 | — | — | CN | disclosed |
| EP-4130010-B1 | ZINC COMPOUND, RAW MATERIAL FOR THIN FILM FORMATION, THIN FILM, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORP (JP) | 2026-04-29 | — | — | EP | disclosed |
| US-20030162126-A1 | Photothermography, lithographic printing plates | EASTMAN KODAK COMPANY | 2003-08-28 | — | — | US | disclosed |
| US-6117487-A | METAL OXIDE FILM FORMED BY VAPOR DEPOSITION | ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) | 2000-09-12 | — | — | US | disclosed |
| US-4051229-A | REDUCTION OF ALKALI OR ALKALINE EARTH CHLORATE IN SULFURIC OR HYDROCHLORIC ACID WITH COMPLEX B-DIKETONE-PALLADIUM CATALYST | THE JAPAN CARLIT CO., LTD. (JA) | 1977-09-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12630570-B2 | Organometallic adduct compound and method of manufacturing integrated circuit device by using the same | C5, AFF2, AFF4 | ALDH1A1 940/4885TDP1 3376/4885TSHR 2193/4885 |
| US-20110137069-A1 | METHOD FOR PRODUCING BIPHENYLTETRACARBOXYLIC ACID TETRAESTER | DDT, PCCA, SOD1 | ALDH1A1 349/4885TDP1 3731/4885TSHR 1818/4885 |
| US-20030203102-A1 | Raw material compounds for use in CVD, and chemical vapor depsoition of ruthenium compound thin films | DEK, DKK1, DCUN1D5 | ALDH1A1 2058/4885TDP1 1519/4885TSHR 4867/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.