Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MMP1 | P03956 | 2/20 | 0.37 |
| ▸ | MMP2 | P08253 | 2/20 | 0.37 |
| ▸ | MMP3 | P08254 | 1/20 | 0.37 |
| ▸ | CA1 | P00915 | 2/20 | 0.33 |
| ▸ | CA2 | P00918 | 2/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | MMP8 | P22894 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | FOLH1 | Q04609 | 2/20 | 0.32 |
| ▸ | NAALAD2 | Q9Y3Q0 | 2/20 | 0.32 |
| ▸ | TSHR | P16473 | 3/20 | 0.32 |
| ▸ | USP2 | O75604 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | CA7 | P43166 | 1/20 | 0.31 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | GLS | O94925 | 1/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15992208 | 0.92 | MMP1 (0.41) | MMP1MMP2MMP3CA1CA2 | |
| SCHEMBL181668 | 0.83 | CYP2D6 (0.36) | MMP1MMP2MMP3CA1CA2 | |
| SCHEMBL20363804 | 0.82 | USP2 (0.41) | MMP1MMP2MMP3CA1CA2 | |
| SCHEMBL17721373 | 0.80 | FDPS (0.41) | CA1CA2TSHRHSD17B10CA7 | |
| SCHEMBL13387016 | 0.80 | FDPS (0.41) | MMP1MMP2MMP3CA1CA2 | |
| SCHEMBL9282807 | 0.80 | CYP2D6 (0.35) | MMP1MMP2MMP3CA1CA2 | |
| SCHEMBL29035568 | 0.80 | CYP2D6 (0.35) | MMP1MMP2MMP3CA1CA2 | |
| SCHEMBL30534795 | 0.80 | CYP2D6 (0.35) | MMP1MMP2MMP3CA1CA2 | |
| SCHEMBL30534794 | 0.80 | CYP2D6 (0.35) | MMP1MMP2MMP3CA1CA2 | |
| SCHEMBL30534812 | 0.80 | CYP2D6 (0.35) | MMP1MMP2MMP3CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 197 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12630570-B2 | Organometallic adduct compound and method of manufacturing integrated circuit device by using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-05-19 | — | — | US | disclosed |
| CN-115362157-B | Zinc compound, raw material for forming thin film, and method for producing same | 株式会社ADEKA | 2026-05-15 | — | — | CN | disclosed |
| EP-4130010-B1 | ZINC COMPOUND, RAW MATERIAL FOR THIN FILM FORMATION, THIN FILM, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORP (JP) | 2026-04-29 | — | — | EP | disclosed |
| EP-4067365-B1 | COMPOUND, THIN FILM-FORMING MATERIAL, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORP (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12577660-B2 | Compound, thin-film forming raw material, thin-film, and method of producing thin-film | ADEKA CORPORATION (JP) | 2026-03-17 | — | — | US | disclosed |
| US-20260055507-A1 | THIN-FILM FORMING RAW MATERIAL, THIN-FILM AND METHOD OF PRODUCING THIN-FILM | ADEKA CORPORATION (JP) | 2026-02-26 | — | — | US | disclosed |
| US-20260055506-A1 | HALOGEN COMPOUND | ADEKA CORPORATION (JP) | 2026-02-26 | — | — | US | disclosed |
| US-12516415-B2 | Reactive material and method of producing thin-film | ADEKA CORPORATION (JP) | 2026-01-06 | — | — | US | disclosed |
| US-12509764-B2 | Thin-film forming raw material used in atomic layer deposition method, and method of producing thin-film | ADEKA CORPORATION (JP) | 2025-12-30 | — | — | US | disclosed |
| EP-4660187-A1 | COMPOUND, RAW MATERIAL FOR THIN FILM FORMATION, THIN FILM, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORPORATION (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20070178235-A1 | Thin film-forming material and method for producing thin film | ADEKA CORPORATION (JP) | 2007-08-02 | — | — | US | disclosed |
| EP-1770187-A1 | THIN FILM-FORMING MATERIAL AND METHOD FOR PRODUCING THIN FILM | Adeka Corporation (JP) | 2007-04-04 | — | — | EP | disclosed |
| EP-1754800-A1 | MATERIAL FOR CHEMICAL VAPOR DEPOSITION AND THIN FILM FORMING METHOD | Adeka Corporation (JP) | 2007-02-21 | — | — | EP | disclosed |
| US-6258157-B1 | BETA-DIKETONATES | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2001-07-10 | — | — | US | disclosed |
| US-6258157-B1 | BETA-DIKETONATES | PRESIDENT AND FELLOWS OF HARVARD COLLEGE | 2001-07-10 | — | — | US | disclosed |
| US-6117487-A | METAL OXIDE FILM FORMED BY VAPOR DEPOSITION | ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) | 2000-09-12 | — | — | US | disclosed |
| US-5980983-A | DEPOSITING A MIXTURE OF METAL BETA-DIKETONATES IN PRESENCE OF OXYGEN, VAPORIZING TO FORM HIGH-PURITY INORGANIC OXIDE LAYER; ELECTRICAL RESISTANCE, HIGH TRANSPARENCY TO LIGHT | THE PRESIDENT AND FELLOWS OF HARVARD UNIVERSITY (US) | 1999-11-09 | — | — | US | disclosed |
| US-5980983-A | DEPOSITING A MIXTURE OF METAL BETA-DIKETONATES IN PRESENCE OF OXYGEN, VAPORIZING TO FORM HIGH-PURITY INORGANIC OXIDE LAYER; ELECTRICAL RESISTANCE, HIGH TRANSPARENCY TO LIGHT | THE PRESIDENT AND FELLOWS OF HARVARD UNIVERSITY (US) | 1999-11-09 | — | — | US | disclosed |
| WO-1998046617-A1 | LIQUID PRECURSOR FOR FORMATION OF METAL OXIDES | THE PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 1998-10-22 | — | — | WO | disclosed |
| WO-1998046617-A1 | LIQUID PRECURSOR FOR FORMATION OF METAL OXIDES | THE PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) | 1998-10-22 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260055506-A1 | HALOGEN COMPOUND | SLC9A2, SLC9A1, SLC9B2 | MMP1 4015/4885MMP2 4317/4885MMP3 3044/4885 |
| US-12509764-B2 | Thin-film forming raw material used in atomic layer deposition method, and method of producing thin-film | FTO, NOS1, NOS3 | MMP1 3171/4885MMP2 3405/4885MMP3 3800/4885 |
| US-12630570-B2 | Organometallic adduct compound and method of manufacturing integrated circuit device by using the same | C5, AFF2, AFF4 | MMP1 4792/4885MMP2 4818/4885MMP3 4846/4885 |
| US-20260055507-A1 | THIN-FILM FORMING RAW MATERIAL, THIN-FILM AND METHOD OF PRODUCING THIN-FILM | TMEM109, FTO, YTHDF2 | MMP1 4720/4885MMP2 4795/4885MMP3 4837/4885 |
| US-12577660-B2 | Compound, thin-film forming raw material, thin-film, and method of producing thin-film | METTL14, YTHDF2, YTHDF1 | MMP1 2870/4885MMP2 2224/4885MMP3 3996/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.