SCHEMBL4172887

SCHEMBL4172887

Cc1cc2ccccc2c(O)c1O

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.54
HTT P42858 1/20 0.54
CYP2A6 P11509 3/20 0.50
CYP1A2 P05177 3/20 0.50
PKM P14618 1/20 0.50
CASP6 P55212 1/20 0.48
PTGS1 P23219 1/20 0.47
PTGS2 P35354 1/20 0.47
PTPN22 Q9Y2R2 1/20 0.46
TRPM4 Q8TD43 1/20 0.46
NQO2 P16083 1/20 0.45
ALDH1A1 P00352 3/20 0.44
HSD17B10 Q99714 2/20 0.44
HPGD P15428 1/20 0.44
NQO1 P15559 1/20 0.43
KDM4E B2RXH2 1/20 0.41
MAPT P10636 1/20 0.41
ALOX12 P18054 1/20 0.41
TSHR P16473 1/20 0.41
HIF1A Q16665 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6391051 0.89 PTPN22 (0.68) LMNAHTTCYP2A6CYP1A2PTGS1
SCHEMBL30071634 0.84 LMNA (0.52) LMNAHTTCYP2A6CYP1A2PKM
SCHEMBL3953630 0.84 LMNA (0.52) LMNAHTTCYP2A6CYP1A2PKM
SCHEMBL30364741 0.84 TRPM4 (0.50) LMNAHTTCYP2A6CYP1A2PKM
SCHEMBL3262903 0.84 LMNA (0.52) LMNAHTTCYP2A6CYP1A2PKM
SCHEMBL31277250 0.84 LMNA (0.52) LMNAHTTCYP2A6CYP1A2PKM
SCHEMBL15485758 0.84 NQO1 (0.50) LMNAHTTCYP2A6CYP1A2PKM
SCHEMBL50068 0.84 TRPM4 (0.50) LMNAHTTCYP2A6CYP1A2PKM
SCHEMBL7122796 0.83 LMNA (0.45) LMNAHTTCYP2A6CYP1A2PKM
SCHEMBL29344183 0.81 CYP1A2 (0.45) LMNAHTTCYP2A6CYP1A2PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 116 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2660257-B1 AROMATIC HYDROCARBON RESIN, COMPOSITION FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, AND METHOD FOR FORMING MULTILAYER RESIST PATTERN MITSUBISHI GAS CHEMICAL CO (JP) 2018-09-19 EP claimed
US-8741553-B2 Aromatic hydrocarbon resin, underlayer film forming composition for lithography, and method for forming multilayer resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-03 US claimed
EP-2660257-A1 AROMATIC HYDROCARBON RESIN, COMPOSITION FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, AND METHOD FOR FORMING MULTILAYER RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2013-11-06 EP claimed
US-20130280655-A1 AROMATIC HYDROCARBON RESIN, UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, AND METHOD FOR FORMING MULTILAYER RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-10-24 US claimed
US-5597876-A CURING AGENT PROVIDES BETTER MECHANICAL PROPERTIES AT HIGH TEMPERATURE SHELL OIL COMPANY (US) 1997-01-28 US claimed
CN-115135692-B Active ester resin, epoxy resin composition, cured product thereof, prepreg, laminated board and stacked film 日铁化学材料株式会社 2025-02-18 CN disclosed
CN-111655662-B Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method 三菱瓦斯化学株式会社 2023-09-26 CN disclosed
CN-115135692-A Active ester resin, epoxy resin composition, cured product thereof, prepreg, laminate, and deposited film 日铁化学材料株式会社 2022-09-30 CN disclosed
US-11052027-B2 Use of sodium chloride in bleaching agents based on percarbonate for human hair application HENKEL AG & CO. KGAA (DE) 2021-07-06 US disclosed
US-10723690-B2 (Meth)acryloyl compound and method for producing same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-07-28 US disclosed
US-20200206104-A1 USE OF SODIUM CHLORIDE IN BLEACHING AGENTS BASED ON PRECARBONATE FOR HUMAN HAIR APPLICATION HENKEL AG & CO. KGAA (DE) 2020-07-02 US disclosed
US-10667997-B2 Thickened oxidation composition HENKEL AG & CO. KGAA (DE) 2020-06-02 US disclosed
US-5597876-A CURING AGENT PROVIDES BETTER MECHANICAL PROPERTIES AT HIGH TEMPERATURE SHELL OIL COMPANY (US) 1997-01-28 US disclosed
EP-0720630-A1 EPOXY RESIN COMPOSITION SHELL INTERNATIONALE RESEARCHMAATSCHAPPIJ B.V. (NL) 1996-07-10 EP disclosed
EP-0682052-A1 Composition of epoxy resins based on condensed polynuclear aromatic compounds SHELL INTERNATIONALE RESEARCHMAATSCHAPPIJ B.V. (NL) 1995-11-15 EP disclosed
WO-1995008584-A1 EPOXY RESIN COMPOSITION SHELL INTERNATIONALE RESEARCH MAATSCHAPPIJ B.V. (NL) 1995-03-30 WO disclosed
US-4657838-A DEVELOPMENT OF ELECTROSTATIC IMAGES CANON KABUSHIKI KAISHA (JP) 1987-04-14 US disclosed
US-4225695-A LACQUERS FOR LEATHER BAYER AKTIENGESELLSCHAFT (DE) 1980-09-30 US disclosed
US-4107012-A COATINGS, PRINTING INKS BAYER AKTIENGESELLSCHAFT (DE) 1978-08-15 US disclosed
US-3996284-A Naphthyl and tetrahydronaphthyl di-ethers NAUTA WIJBE THOMAS 1976-12-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10723690-B2 (Meth)acryloyl compound and method for producing same MTR, MRM1, MT-CO1 LMNA 2183/4885HTT 1240/4885CYP2A6 713/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.