SCHEMBL4177732

SCHEMBL4177732

[O-]c1ccc([P+](c2ccccc2)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.38

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
HIF1A Q16665 1/20 0.38
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
UQCRB P14927 1/20 0.31
MAPT P10636 1/20 0.30
HPGD P15428 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
MGLL Q99685 1/20 0.30
HSD17B10 Q99714 1/20 0.30
CYP3A4 P08684 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetraphenylphosphonium SCHEMBL49763 0.92 HIF1A (0.39) HIF1ACA1CA2MAPTHPGD
Tetraphenylphosphonium SCHEMBL6469728 0.85 UQCRB (0.38) HIF1ACA1CA2UQCRBMGLL
Tetraphenylphosphonium SCHEMBL6471806 0.84 CA1 (0.41) HIF1ACA1CA2UQCRBMGLL
Tetraphenylphosphonium SCHEMBL6567177 0.82 HIF1A (0.41) HIF1AMAPTHPGDSMN1; SMN2MGLL
Tetraphenylphosphonium SCHEMBL7176472 0.82 HIF1A (0.41) HIF1AMAPTHPGDSMN1; SMN2MGLL
Tetraphenylphosphonium SCHEMBL4428554 0.82 HIF1A (0.41) HIF1AMAPTHPGDSMN1; SMN2MGLL
Tetraphenylphosphonium SCHEMBL20836022 0.82 HTR6 (0.52) UQCRBMAPTHPGDSMN1; SMN2CYP3A4
Tetraphenylphosphonium SCHEMBL29362652 0.82 HIF1A (0.50) HIF1ACA1CA2MAPTHPGD
Tetraphenylphosphonium SCHEMBL8468776 0.80 CA12 (0.50) HIF1ACA1CA2CYP3A4TDP1
Phenol SCHEMBL7872891 0.80 ALOX12 (0.43) CA1CA2MAPTHPGDSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106916270-B Multi-alkyne compound and preparation method and application thereof 爱沃特株式会社 2020-07-21 CN disclosed
CN-106977376-B Vinylbenzylated phenol compound, active ester resin, thermosetting resin composition, cured product, interlayer insulating material, and prepreg 爱沃特株式会社 2020-06-09 CN disclosed
CN-106084184-B Composition, epoxy resin curing agent, epoxy resin composition, thermosetting composition, cured product, semiconductor device, and interlayer insulating material 爱沃特株式会社 2020-05-01 CN disclosed
CN-107614564-B Thermal expansion modifier, use thereof as thermal expansion modifier, and thermosetting resin composition 爱沃特株式会社 2020-04-14 CN disclosed
CN-110770276-A Composition, epoxy resin curing agent, epoxy resin composition, thermosetting composition, cured product, semiconductor device, and interlayer insulating material 爱沃特株式会社 2020-02-07 CN disclosed
CN-101155854-B Curing-accelerating compound-silica composite, method for producing curing-accelerating compound-silica composite, curing accelerator, curable resin composition, and electronic component device HITACHI CHEMICAL CO LTD 2011-09-07 CN disclosed
US-7585904-B2 Curing accelerator comprising a reaction product of an intramolecular phosphonium salt and a silanol compound; suitable as a material for laminates and adhesives and an electronic parts device comprising an element that has been encapsulated using such a curable resin composition HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-09-08 US disclosed
US-20090012232-A1 Curing accelerator comprising a reaction product of an intramolecular phosphonium salt and a silanol compound; suitable as a material for laminates and adhesives and an electronic parts device comprising an element that has been encapsulated using such a curable resin composition HITACHI CHEMICAL CO., LTD. (JP) 2009-01-08 US disclosed
CN-101155854-A Curing-accelerating compound-silica composite, method for producing curing-accelerating compound-silica composite, curing accelerator, curable resin composition, and electronic component device HITACHI CHEMICAL CO LTD (JP) 2008-04-02 CN disclosed