Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 1/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.50 |
| ▸ | ADRA2A | P08913 | 2/20 | 0.44 |
| ▸ | ADRA1A | P35348 | 2/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | BLM | P54132 | 1/20 | 0.42 |
| ▸ | LPAR1 | Q92633 | 4/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | USP2 | O75604 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12476289 | 0.86 | ACHE (0.54) | ACHEALDH1A1CYP3A4ADRA2AADRA1A | |
| SCHEMBL14538804 | 0.83 | ACHE (0.56) | ACHEALDH1A1CYP3A4ADRA1AMEN1 | |
| SCHEMBL16240773 | 0.83 | AMY1A (0.41) | ACHEALDH1A1CYP3A4ADRA2AADRA1A | |
| SCHEMBL6858946 | 0.82 | CTSA (0.44) | ACHEALDH1A1CYP3A4ADRA2AADRA1A | |
| SCHEMBL17326806 | 0.81 | ACHE (0.48) | ACHEALDH1A1CYP3A4ADRA2AADRA1A | |
| SCHEMBL29591727 | 0.81 | ACHE (0.58) | ACHEALDH1A1CYP3A4ADRA1ACYP2D6 | |
| SCHEMBL10238859 | 0.81 | ACHE (0.58) | ACHEALDH1A1CYP3A4ADRA1ACYP2D6 | |
| SCHEMBL14805541 | 0.80 | ACHE (0.47) | ACHEALDH1A1CYP3A4ADRA2AADRA1A | |
| SCHEMBL5051458 | 0.80 | ADRA2A (0.71) | ACHEALDH1A1CYP3A4ADRA2AADRA1A | |
| SCHEMBL7786327 | 0.80 | ADRA2A (0.71) | ACHEALDH1A1CYP3A4ADRA2AADRA1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0212482-B1 | PROCESS FOR OBTAINING NEGATIVE IMAGES FROM POSITIVE PHOTORESISTS | HOECHST CELANESE CORPORATION (US) | 1989-04-19 | — | — | EP | claimed |
| US-12572075-B2 | Composition, method of forming resist underlayer film, and method of forming resist pattern | JSR CORPORATION (JP) | 2026-03-10 | — | — | US | disclosed |
| US-12265333-B2 | Composition, resist underlayer film, method of forming resist underlayer film, method of producing patterned substrate, and compound | JSR CORPORATION (JP) | 2025-04-01 | — | — | US | disclosed |
| US-20240231231-A1 | METHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION, AND RESIST UNDERLAYER FILM | JSR CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-20240030030-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | JSR CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240021429-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | JSR CORPORATION (JP) | 2024-01-18 | — | — | US | disclosed |
| EP-4270448-A1 | FILM FORMATION METHOD AND ARTICLE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2023-11-01 | — | — | EP | disclosed |
| US-20230343591-A1 | FILM FORMING METHOD AND ARTICLE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2023-10-26 | — | — | US | disclosed |
| WO-2023021971-A1 | METHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND RESIST UNDERLAYER FILM, | JSR株式会社 | 2023-02-23 | — | — | WO | disclosed |
| US-20230041656-A1 | COMPOSITION, METHOD OF FORMING RESIST UNDERLAYER FILM, AND METHOD OF FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2023-02-09 | — | — | US | disclosed |
| US-20150198882-A9 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM AND RESIST UNDERLAYER FILM-FORMING METHOD, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20140272722-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM AND RESIST UNDERLAYER FILM-FORMING METHOD, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2014-09-18 | — | — | US | disclosed |
| US-8674043-B2 | Photosensitive resin composition containing copolymer | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-03-18 | — | — | US | disclosed |
| US-8551453-B2 | Aromatic triamide-lanthanide complexes | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2013-10-08 | — | — | US | disclosed |
| EP-2479612-A1 | PHOTOSENSITIVE RESIN COMPOSITION CONTAINING COPOLYMER | Nissan Chemical Industries, Ltd. (JP) | 2012-07-25 | — | — | EP | disclosed |
| US-20120172557-A1 | PHOTOSENSITIVE RESIN COMPOSITION CONTAINING COPOLYMER | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20090036537-A1 | AROMATIC TRIAMIDE-LANTHANIDE COMPLEXES | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2009-02-05 | — | — | US | disclosed |
| EP-1706452-B1 | AROMATIC TRIAMIDE-LANTHANIDE COMPLEXES | UNIV CALIFORNIA OFFICE OF THE (US) | 2008-09-03 | — | — | EP | disclosed |
| US-5306595-A | A mixtures consists of water insoluble binder and ester condensation product of aromatic hydroxy and quinone diazides; solubility in solvents, storage stability | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-04-26 | — | — | US | disclosed |
| US-5114816-A | RADIATION-SENSITIVE COMPOUNDS, RADIATION-SENSITIVE MIXTURE PREPARED THEREWITH AND COPYING MATERIAL | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-05-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12572075-B2 | Composition, method of forming resist underlayer film, and method of forming resist pattern | TOP1, NAF1, ASH2L | ACHE 3866/4885ALDH1A1 2358/4885CYP3A4 2705/4885 |
| US-20090036537-A1 | AROMATIC TRIAMIDE-LANTHANIDE COMPLEXES | TRPV5, TRPC5, TRPM5 | ACHE 1881/4885ALDH1A1 3077/4885CYP3A4 3870/4885 |
| US-12265333-B2 | Composition, resist underlayer film, method of forming resist underlayer film, method of producing patterned substrate, and compound | TOP1, RER1, ABCC1 | ACHE 1882/4885ALDH1A1 2120/4885CYP3A4 810/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.