Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 13/20 | 0.36 |
| ▸ | ACHE | P22303 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | CNR2 | P34972 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL220080 | 1.00 | HSD11B1 (0.36) | HSD11B1ACHEKMT2ACNR2ALDH1A1 | |
| SCHEMBL384343 | 0.96 | ALDH1A1 (0.34) | HSD11B1ACHEKMT2ACNR2ALDH1A1 | |
| SCHEMBL447472 | 0.87 | ACHE (0.35) | HSD11B1ACHEKMT2ACNR2ALDH1A1 | |
| SCHEMBL384824 | 0.87 | NR1I2 (0.34) | HSD11B1ACHEKMT2AALDH1A1SMN1; SMN2 | |
| SCHEMBL217323 | 0.85 | ALDH1A1 (0.32) | HSD11B1CNR2ALDH1A1SMN1; SMN2HSD17B10 | |
| SCHEMBL6339986 | 0.85 | CNR2 (0.31) | CNR2 | |
| SCHEMBL4480664 | 0.83 | NR1I2 (0.32) | — | |
| SCHEMBL384856 | 0.82 | — | — | |
| SCHEMBL447468 | 0.82 | PTGS2 (0.33) | CNR2 | |
| SCHEMBL4852337 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 243 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11884839-B2 | Acetal-protected silanol group-containing polysiloxane composition | NISSAN CHEMICAL CORPORATION (JP) | 2024-01-30 | — | — | US | disclosed |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-11561472-B2 | Radiation sensitive composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-01-24 | — | — | US | disclosed |
| EP-3309614-B1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL CORP (JP) | 2021-11-10 | — | — | EP | disclosed |
| US-20190185707-A1 | ACETAL-PROTECTED SILANOL GROUP-CONTAINING POLYSILOXANE COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2019-06-20 | — | — | US | disclosed |
| US-10025188-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-17 | — | — | US | disclosed |
| US-20180181000-A1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-06-28 | — | — | US | disclosed |
| EP-3309614-A1 | RADIATION SENSITIVE COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2018-04-18 | — | — | EP | disclosed |
| US-20170322492-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-11-09 | — | — | US | disclosed |
| US-20160320705-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2016-11-03 | — | — | US | disclosed |
| US-20040229162-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-11-18 | — | — | US | disclosed |
| US-20040167322-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-08-26 | — | — | US | disclosed |
| US-20040166432-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-08-26 | — | — | US | disclosed |
| US-6713612-B2 | Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-03-30 | — | — | US | disclosed |
| US-20040033432-A1 | Novel sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-02-19 | — | — | US | disclosed |
| US-20040033440-A1 | Photoacid generators, chemically amplified positive resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-02-19 | — | — | US | disclosed |
| US-6689530-B2 | ULTRAVIOLET LITHOGRAPHY MICROFABRICATION WITH IMPROVED RESOLUTION AND PATTERN PROFILE AFTER DEVELOPMENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-02-10 | — | — | US | disclosed |
| US-20030224298-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-04 | — | — | US | disclosed |
| US-20030215738-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-11-20 | — | — | US | disclosed |
| US-20030180653-A1 | Novel sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-09-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (9 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040033432-A1 | Novel sulfonydiazomethanes, photoacid generators, resist compositions, and patterning process | POLL, PIM3, VEGFA | HSD11B1 2690/4885ACHE 4834/4885KMT2A 1420/4885 |
| US-20030224298-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | VEGFA, DNMT3A, PIM3 | HSD11B1 2514/4885ACHE 4580/4885KMT2A 1111/4885 |
| US-11561472-B2 | Radiation sensitive composition | RER1, RAD1, RAD51 | HSD11B1 1997/4885ACHE 4152/4885KMT2A 853/4885 |
| US-20030215738-A1 | Photoacid generators, chemically amplified resist compositions, and patterning process | CCNH, PAH, POLH | HSD11B1 1904/4885ACHE 4861/4885KMT2A 890/4885 |
| US-20030180653-A1 | Novel sulfonyldiazomethanes, photoacid generations, resist compositions, and patterning process | CACNA1A, KCNA1, POLL | HSD11B1 3583/4885ACHE 4680/4885KMT2A 232/4885 |
| US-20040167322-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | POLL, VEGFA, PIM3 | HSD11B1 3088/4885ACHE 4704/4885KMT2A 660/4885 |
| US-20180181000-A1 | RADIATION SENSITIVE COMPOSITION | RER1, RAD1, RAD51 | HSD11B1 1689/4885ACHE 4179/4885KMT2A 776/4885 |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | XRCC6, RAD50, XRCC5 | HSD11B1 380/4885ACHE 4452/4885KMT2A 3292/4885 |
| US-20040166432-A1 | Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process | VEGFA, POLL, PIM3 | HSD11B1 2291/4885ACHE 4610/4885KMT2A 679/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.