Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | RORA | P35398 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 9/20 | 0.36 |
| ▸ | ACHE | P22303 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 8/20 | 0.35 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | MMP1 | P03956 | 1/20 | 0.34 |
| ▸ | MMP2 | P08253 | 1/20 | 0.34 |
| ▸ | MMP9 | P14780 | 1/20 | 0.34 |
| ▸ | MMP8 | P22894 | 1/20 | 0.34 |
| ▸ | MMP13 | P45452 | 1/20 | 0.34 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.34 |
| ▸ | MAPT | P10636 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 2/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | GMNN | O75496 | 1/20 | 0.34 |
| ▸ | DRD1 | P21728 | 1/20 | 0.34 |
| ▸ | DRD3 | P35462 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8038207 | 1.00 | ALDH1A1 (0.38) | ALDH1A1RORACA2ACHECA1 | |
| SCHEMBL114859 | 0.98 | ALDH1A1 (0.39) | ALDH1A1RORACA2ACHECA1 | |
| SCHEMBL5372804 | 0.95 | HSD11B1 (0.37) | ALDH1A1RORACA2ACHECA1 | |
| SCHEMBL7570325 | 0.94 | ALDH1A1 (0.36) | ALDH1A1RORACA2ACHECA1 | |
| SCHEMBL2438900 | 0.94 | ALDH1A1 (0.42) | ALDH1A1RORACA2ACHECA1 | |
| SCHEMBL7708260 | 0.93 | HSD11B1 (0.38) | ALDH1A1RORACA2ACHECA1 | |
| SCHEMBL548235 | 0.88 | CA2 (0.38) | ALDH1A1CA2CA1MMP1MMP2 | |
| SCHEMBL2438901 | 0.87 | RORA (0.38) | ALDH1A1RORAACHELMNAGAA | |
| SCHEMBL29625803 | 0.86 | ALDH1A1 (0.31) | ALDH1A1RORACA2CA1 | |
| SCHEMBL548591 | 0.86 | KIF11 (0.38) | ALDH1A1CA2CA1MMP1MMP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 711 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10662274-B2 | Self-immolative polymers, articles thereof, and methods of making and using same | GEORGIA TECH RESEARCH CORPORATION (US) | 2020-05-26 | — | — | US | claimed |
| US-20180155483-A1 | SELF-IMMOLATIVE POLYMERS, ARTICLES THEREOF, AND METHODS OF MAKING AND USING SAME | GEORGIA TECH RESEARCH CORPORATION | 2018-06-07 | — | — | US | claimed |
| US-9740096-B2 | Positive-tone, chemically amplified, aqueous-developable, permanent dielectric | GEORGIA TECH RESEARCH CORPORATION (US) | 2017-08-22 | — | — | US | claimed |
| US-20150160551-A1 | POSITIVE-TONE, CHEMICALLY AMPLIFIED, AQUEOUS-DEVELOPABLE, PERMANENT DIELECTRIC | GEORGIA TECH RESEARCH CORPORATION (US) | 2015-06-11 | — | — | US | claimed |
| EP-4747233-A2 | COMPOUNDS, COMPOSITIONS CONTAINING COMPOUNDS, AND METHODS OF MANUFACTURING RESIST MEMBRANES | Merck Patent GmbH (DE) | 2026-05-27 | — | — | EP | disclosed |
| US-12631962-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| US-12624392-B2 | Molecular array generation using photoresist | 10X GENOMICS, INC. (US) | 2026-05-12 | — | — | US | disclosed |
| US-20250362597-A1 | RESIST COMPOSITION AND RESIST FILM FORMING METHOD USING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250321485-A1 | RESIST AUXILIARY FILM COMPOSITION, AND PATTERN FORMING METHOD USING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-10-16 | — | — | US | disclosed |
| US-12393115-B2 | Positive working photosensitive material | MERCK PATENT GMBH (DE) | 2025-08-19 | — | — | US | disclosed |
| EP-4516394-A2 | HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST | 10x Genomics, Inc. (US) | 2025-03-05 | — | — | EP | disclosed |
| WO-2025017121-A2 | COMPOUNDS, COMPOSITIONS CONTAINING COMPOUNDS, AND METHODS OF MANUFACTURING RESIST MEMBRANES | MERCK PATENT GMBH (DE) | 2025-01-23 | — | — | WO | disclosed |
| US-6203965-B1 | USEFUL AS DEEP ULTRAVIOLET RADIATION PHOTORESISTS | SHIPLEY COMPANY, L.L.C. | 2001-03-20 | — | — | US | disclosed |
| US-6200728-B1 | Photoresist compositions comprising blends of photoacid generators | SHIPLEY COMPANY, L.L.C. | 2001-03-13 | — | — | US | disclosed |
| EP-1041442-A1 | Chemical amplification type positive resist | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-10-04 | — | — | EP | disclosed |
| EP-1030221-A1 | Photoresist compositions comprising blends of photoacid generators | Shipley Company LLC (US) | 2000-08-23 | — | — | EP | disclosed |
| US-6048672-A | RELIEF IMAGES ON SUBSTRATES WITH TITANIUM NITRIDE SURFACES, HEATING, COATING, EXPOSURE AND DEVELOPMENT | SHIPLEY COMPANY, L.L.C. (US) | 2000-04-11 | — | — | US | disclosed |
| EP-0987600-A1 | Antireflective coating compositions | Shipley Company LLC (US) | 2000-03-22 | — | — | EP | disclosed |
| US-6037107-A | EXPOSING TO ACTIVATION RADIATION A POSITIVE WORKING PHOTORESIST COMPRISING AN ALKALI SOLUBLE RESIN SUBSTITUTED WITH AN ACID LABILE BLOCKING GROUP TO GENERATE HALOGENATED SULFONIC ACID BY PHOTOLYSIS | SHIPLEY COMPANY, L.L.C. (US) | 2000-03-14 | — | — | US | disclosed |
| EP-0938029-A2 | Methods using photoresist compositions and articles produced therewith | Shipley Company LLC (US) | 1999-08-25 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12631962-B2 | Resist composition and method for forming resist pattern | TERB1, TERF2, LSM8 | ALDH1A1 1639/4885RORA 1130/4885CA2 677/4885 |
| US-12624392-B2 | Molecular array generation using photoresist | POLL, LIG4, LIG3 | ALDH1A1 189/4885RORA 2222/4885CA2 2965/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.