SCHEMBL465375

SCHEMBL465375

CCCC(O)N(CCC)C(O)CCC

nearest known ligand 0.32

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.32
TSHR P16473 1/20 0.32
FDPS P14324 1/20 0.31
CHRM1 P11229 1/20 0.31
AKR1A1 P14550 1/20 0.31
CHRM3 P20309 1/20 0.31
HTR2A P28223 1/20 0.31
HTR2C P28335 1/20 0.31
ADRA1A P35348 1/20 0.31
HRH1 P35367 1/20 0.31
DRD3 P35462 1/20 0.31
SLC6A3 Q01959 1/20 0.31
HDAC1 Q13547 1/20 0.31
HDAC2 Q92769 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
CA12 O43570 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA9 Q16790 1/20 0.31
AOC3 Q16853 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28257130 0.92 TSHR (0.33) LMNATSHRFDPSCHRM1AKR1A1
SCHEMBL974560 0.84 DNM1 (0.35) LMNACA12CA1CA2CA9
SCHEMBL465289 0.84 ALDH1A1 (0.36) FDPSCA1CA2
SCHEMBL465302 0.82 GPR84 (0.40) LMNAFDPS
SCHEMBL5420172 0.82 AOC3 (0.32) AOC3
SCHEMBL4939464 0.82 DNM1 (0.44) LMNACA12CA1CA2CA9
SCHEMBL9807850 0.80 DNM1 (0.48) LMNACA12CA1CA2CA9
SCHEMBL9807814 0.80 DNM1 (0.48) LMNACA12CA1CA2CA9
SCHEMBL465474 0.80 TSHR (0.35) TSHRFDPSCA12CA1CA2
SCHEMBL465377 0.80 TSHR (0.33) LMNATSHRFDPSCHRM1AKR1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 123 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10113049-B2 Thermoplastic resin composition NIPPON NYUKAZAI CO., LTD. (JP) 2018-10-30 US claimed
US-20150329698-A1 THERMOPLASTIC RESIN COMPOSITION NIPPON NYUKAZAI CO., LTD. (JP) 2015-11-19 US claimed
US-20080066644-A1 Alkylmines, alkanolamine compounds, surfactants, a coloring agent and a solvent; combination results in decreased kogation SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-03-20 US claimed
EP-1900785-A1 Ink Composition for Inkjet Recording Samsung Electronics Co., Ltd. (KR) 2008-03-19 EP claimed
EP-3518874-B1 METHODS, COMPOSITIONS AND USES RELATING THERETO INNOSPEC LTD (GB) 2023-08-16 EP disclosed
WO-2023131780-A1 CORROSION INHIBITOR INNOSPEC LIMITED (GB) 2023-07-13 WO disclosed
US-11311471-B2 Methods, compositions and uses relating thereto INNOSPEC LIMITED (GB) 2022-04-26 US disclosed
US-11253453-B2 Reducing colour loss from a dyed material by using an amine salt of a carboxylic acid INNOSPEC LIMITED (GB) 2022-02-22 US disclosed
US-11234917-B2 Methods, compositions and uses relating thereto INNOSPEC LIMITED (GB) 2022-02-01 US disclosed
EP-3518873-B1 METHODS, COMPOSITIONS AND USES RELATING THERETO INNOSPEC LTD (GB) 2022-01-05 EP disclosed
CN-106795087-B Quaternary ammonium compounds and their use as fuel or lubricant additives 因诺斯佩克有限公司 2020-07-14 CN disclosed
US-10626341-B2 Quaternary ammonium compounds as fuel or lubricant additives INNOSPEC LIMITED (GB) 2020-04-21 US disclosed
US-6413647-B1 USEFUL AS INTERLAYER DIELECTRIC FILM IN SEMICONDUCTOR DEVICES; MECHANICAL STRENGTH JSR CORPORATION (JP) 2002-07-02 US disclosed
US-6410150-B1 Composition for film formation, method of film formation, and insulating film JSR CORPORATION (JP) 2002-06-25 US disclosed
US-6410151-B1 Composition for film formation, method of film formation, and insulating film JSR CORPORATION (JP) 2002-06-25 US disclosed
US-20010018129-A1 Process for producing silica-based film, silica-based film, insulating film, and semiconductor device JSR CORPORATION (JP) 2001-08-30 US disclosed
EP-1127929-A2 Composition for film formation, method of film formation, and silica-based film JSR Corporation (JP) 2001-08-29 EP disclosed
EP-1122770-A2 Silica-based insulating film and its manufacture JSR Corporation (JP) 2001-08-08 EP disclosed
EP-1090967-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-11 EP disclosed
EP-1088868-A2 Composition for film formation, method of film formation, and insulating film JSR Corporation (JP) 2001-04-04 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11311471-B2 Methods, compositions and uses relating thereto LPO, AOC1, HAO2 LMNA 501/4885TSHR 4576/4885FDPS 1551/4885
US-10626341-B2 Quaternary ammonium compounds as fuel or lubricant additives DNMT3A, FANCD2, POLD1 LMNA 3503/4885TSHR 4417/4885FDPS 4599/4885
US-11234917-B2 Methods, compositions and uses relating thereto LPO, CA7, AOX1 LMNA 327/4885TSHR 4573/4885FDPS 2485/4885
US-11253453-B2 Reducing colour loss from a dyed material by using an amine salt of a carboxylic acid CA9, CA12, CA7 LMNA 1011/4885TSHR 4806/4885FDPS 4608/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.