SCHEMBL4834508

SCHEMBL4834508

O=C1C2C(C(=O)N1OS(=O)(=O)c1ccc(Br)cc1)C1C(=O)N(OS(=O)(=O)c3ccc(Br)cc3)C(=O)C21

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 6/20 0.54
ALDH1A1 P00352 6/20 0.54
HPGD P15428 5/20 0.54
MAPT P10636 4/20 0.54
LMNA P02545 1/20 0.54
THRB P10828 1/20 0.54
PARL Q9H300 2/20 0.43
KMT2A Q03164 3/20 0.42
VDR P11473 2/20 0.42
MEN1 O00255 2/20 0.42
MMP2 P08253 4/20 0.41
CA2 P00918 4/20 0.39
F2 P00734 1/20 0.39
PLCG1 P19174 1/20 0.38
HTT P42858 1/20 0.36
CA1 P00915 2/20 0.36
CA9 Q16790 2/20 0.36
CA12 O43570 1/20 0.36
MMP1 P03956 1/20 0.36
MMP9 P14780 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4832240 0.85 KDM4E (0.50) KDM4EALDH1A1HPGDMAPTLMNA
SCHEMBL4829793 0.84 KMT2A (0.60) KDM4EALDH1A1HPGDMAPTLMNA
SCHEMBL4831794 0.82 PARL (0.43) KDM4EALDH1A1HPGDMAPTLMNA
SCHEMBL4827161 0.82 VDR (0.63) KDM4EALDH1A1HPGDMAPTLMNA
SCHEMBL4831944 0.82 ALDH1A1 (0.54) KDM4EALDH1A1HPGDMAPTLMNA
SCHEMBL4829803 0.81 PARL (0.65) KDM4EALDH1A1HPGDMAPTLMNA
SCHEMBL4835021 0.79 GAA (0.49) LMNAPARLKMT2AVDRMEN1
SCHEMBL6650340 0.78 CA1 (0.44) KDM4EALDH1A1HPGDMAPTPARL
SCHEMBL4831892 0.78 KMT2A (0.43) KDM4EALDH1A1HPGDMAPTPARL
SCHEMBL4834719 0.78 ALDH1A1 (0.64) KDM4EALDH1A1HPGDMAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition ASIC1, GAR1, RER1 KDM4E 2501/4885ALDH1A1 633/4885HPGD 2276/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.