SCHEMBL4834719

SCHEMBL4834719

CCc1ccc(S(=O)(=O)ON2C(=O)C3C(C2=O)C2C(=O)N(OS(=O)(=O)c4ccc(CC)cc4)C(=O)C32)cc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.64
KDM4E B2RXH2 3/20 0.64
VDR P11473 2/20 0.64
MAPT P10636 2/20 0.64
F2 P00734 1/20 0.64
CA2 P00918 1/20 0.44
HSD11B1 P28845 1/20 0.41
PARL Q9H300 2/20 0.40
KMT2A Q03164 2/20 0.40
MEN1 O00255 1/20 0.40
HPGD P15428 2/20 0.39
HTR6 P50406 1/20 0.39
TP53 P04637 1/20 0.38
DDB1 Q16531 1/20 0.38
CRBN Q96SW2 1/20 0.38
HTR2A P28223 1/20 0.38
HTR2C P28335 1/20 0.38
LMNA P02545 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
UCHL1 P09936 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4887014 0.91 ALDH1A1 (0.58) ALDH1A1KDM4EVDRMAPTF2
SCHEMBL4833933 0.86 ALDH1A1 (0.59) ALDH1A1KDM4EVDRMAPTF2
SCHEMBL4832006 0.83 CA2 (0.50) ALDH1A1KDM4EVDRMAPTF2
SCHEMBL2952194 0.82 ALDH1A1 (0.66) ALDH1A1KDM4EVDRMAPTF2
SCHEMBL4827161 0.81 VDR (0.63) ALDH1A1KDM4EVDRMAPTF2
SCHEMBL4829793 0.80 KMT2A (0.60) ALDH1A1KDM4EVDRMAPTF2
SCHEMBL4835021 0.79 GAA (0.49) VDRCA2HSD11B1PARLKMT2A
SCHEMBL4830026 0.78 KDM4E (1.00) ALDH1A1KDM4EVDRMAPTF2
SCHEMBL4831794 0.78 PARL (0.43) ALDH1A1KDM4EVDRMAPTF2
SCHEMBL4831944 0.78 ALDH1A1 (0.54) ALDH1A1KDM4EVDRMAPTF2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition ASIC1, GAR1, RER1 ALDH1A1 633/4885KDM4E 2501/4885VDR 4831/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.