SCHEMBL4848783

SCHEMBL4848783

Cc1ccc(S(=O)(=O)S(=O)(=O)c2ccc(C)cc2-c2ccc(Cl)cc2)c(-c2ccc(Cl)cc2)c1

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
AGTR1 P30556 1/20 0.43
PTGS2 P35354 3/20 0.42
ALKBH3 Q96Q83 1/20 0.41
GRM2 Q14416 1/20 0.40
APP P05067 1/20 0.39
PTGS1 P23219 1/20 0.39
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
MAOA P21397 1/20 0.37
MAOB P27338 1/20 0.37
FLT1 P17948 1/20 0.37
FLT4 P35916 1/20 0.37
KDR P35968 1/20 0.37
KIF11 P52732 1/20 0.37
MAPT P10636 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
FFAR4 Q5NUL3 1/20 0.37
METAP2 P50579 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4616262 0.89 AGTR1 (0.43) AGTR1PTGS2ALKBH3GRM2APP
SCHEMBL30874282 0.79 MCL1 (0.39) AGTR1PTGS2GRM2APPMEN1
SCHEMBL10827247 0.77 AHR (0.43) AGTR1PTGS2ALKBH3GRM2MAOA
SCHEMBL8082279 0.76 MAOA (0.41) PTGS2ALKBH3PTGS1MEN1KMT2A
SCHEMBL5280419 0.75 AHR (0.42) AGTR1ALKBH3GRM2KMT2AMAPT
SCHEMBL10419408 0.75 KMT2A (0.44) PTGS2MEN1KMT2AMAPT
SCHEMBL4734280 0.74 PTGS2 (0.53) PTGS2PTGS1MEN1KMT2AMAOA
SCHEMBL1117961 0.74 PTGS2 (0.42) PTGS2GRM2PTGS1MEN1KMT2A
SCHEMBL6389001 0.74 PTGS2 (0.42) PTGS2ALKBH3PTGS1MEN1KMT2A
SCHEMBL10977080 0.73 S100A4 (0.45) PTGS2PTGS1MEN1KMT2AKIF11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1662322-B1 Positive type photo-sensitive siloxane composition, curing film formed by the composition and device with the curing film TORAY INDUSTRIES (JP) 2017-01-11 EP disclosed
US-7374856-B2 Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film TORAY INDUSTRIES, INC. (JP) 2008-05-20 US disclosed
US-20060115766-A1 Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film TORAY INDUSTRIES, INC. (JP) 2006-06-01 US disclosed
EP-1662322-A2 Positive type photo-sensitive siloxane composition, curing film formed by the composition and device with the curing film TORAY INDUSTRIES, INC. (JP) 2006-05-31 EP disclosed