SCHEMBL4887014

SCHEMBL4887014

CCc1ccc(S(=O)(=O)ON2C(=O)C3C4C=CC(C3C2=O)C2C(=O)N(OS(=O)(=O)c3ccc(CC)cc3)C(=O)C42)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.58
KDM4E B2RXH2 3/20 0.58
VDR P11473 2/20 0.58
MAPT P10636 2/20 0.58
F2 P00734 1/20 0.58
CA2 P00918 1/20 0.40
HSD11B1 P28845 1/20 0.38
LMNA P02545 2/20 0.36
HTT P42858 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
PARL Q9H300 2/20 0.36
KMT2A Q03164 2/20 0.36
HTR6 P50406 1/20 0.36
MEN1 O00255 1/20 0.36
HPGD P15428 2/20 0.36
TP53 P04637 1/20 0.35
DDB1 Q16531 1/20 0.35
CRBN Q96SW2 1/20 0.35
HTR2A P28223 1/20 0.35
HTR2C P28335 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4834719 0.91 ALDH1A1 (0.64) ALDH1A1KDM4EVDRMAPTF2
SCHEMBL4826381 0.84 CA2 (0.46) ALDH1A1KDM4EVDRMAPTF2
SCHEMBL4835774 0.84 VDR (0.56) ALDH1A1KDM4EVDRMAPTF2
SCHEMBL4831796 0.81 GAA (0.45) ALDH1A1VDRCA2HSD11B1LMNA
SCHEMBL4833933 0.81 ALDH1A1 (0.59) ALDH1A1KDM4EVDRMAPTF2
SCHEMBL4827225 0.80 PARL (0.57) ALDH1A1KDM4EVDRMAPTF2
SCHEMBL2952194 0.77 ALDH1A1 (0.66) ALDH1A1KDM4EVDRMAPTF2
SCHEMBL4835027 0.77 TDP1 (0.40) ALDH1A1KDM4EVDRMAPTF2
SCHEMBL6420670 0.77 KMT2A (0.39) ALDH1A1KDM4EVDRMAPTCA2
SCHEMBL4832006 0.75 CA2 (0.50) ALDH1A1KDM4EVDRMAPTF2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition ASIC1, GAR1, RER1 ALDH1A1 633/4885KDM4E 2501/4885VDR 4831/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.